Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry

J. Endres, N. Kumar, P. Petrik, M. A. Henn, S. Heidenreich, S. F. Pereira, H. P. Urbach, B. Bodermann

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

Scatterometry is a common tool for the dimensional characterization of periodic nanostructures. In this paper we compare measurement results of two different scatterometric methods: a goniometric DUV scatterometer and a coherent scanning Fourier scatterometer. We present a comparison between these two methods by analyzing the measurement results on a silicon wafer with 1D gratings having periods between 300 nm and 600 nm. The measurements have been performed with PTB's goniometric DUV scatterometer and the coherent scanning Fourier scatterometer at TU Delft. Moreover for the parameter reconstruction of the goniometric measurement data, we apply a maximum likelihood estimation, which provides the statistical error model parameters directly from measurement data.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume9132
ISBN (Print)9781628410808
DOIs
Publication statusPublished - 2014
EventOptical Micro- and Nanometrology V - Brussels, Belgium
Duration: Apr 15 2014Apr 17 2014

Other

OtherOptical Micro- and Nanometrology V
CountryBelgium
CityBrussels
Period4/15/144/17/14

Fingerprint

Scatterometry
scatterometers
Scanning
scanning
Error Model
Maximum likelihood estimation
Nanostructures
Silicon wafers
Maximum Likelihood Estimation
Wafer
Gratings
Statistical Model
Silicon
wafers
gratings
silicon

Keywords

  • CD
  • Inverse diffraction problem
  • Pitch
  • Scatterometry

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Endres, J., Kumar, N., Petrik, P., Henn, M. A., Heidenreich, S., Pereira, S. F., ... Bodermann, B. (2014). Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 9132). [913208] SPIE. https://doi.org/10.1117/12.2052819

Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry. / Endres, J.; Kumar, N.; Petrik, P.; Henn, M. A.; Heidenreich, S.; Pereira, S. F.; Urbach, H. P.; Bodermann, B.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9132 SPIE, 2014. 913208.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Endres, J, Kumar, N, Petrik, P, Henn, MA, Heidenreich, S, Pereira, SF, Urbach, HP & Bodermann, B 2014, Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 9132, 913208, SPIE, Optical Micro- and Nanometrology V, Brussels, Belgium, 4/15/14. https://doi.org/10.1117/12.2052819
Endres J, Kumar N, Petrik P, Henn MA, Heidenreich S, Pereira SF et al. Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9132. SPIE. 2014. 913208 https://doi.org/10.1117/12.2052819
Endres, J. ; Kumar, N. ; Petrik, P. ; Henn, M. A. ; Heidenreich, S. ; Pereira, S. F. ; Urbach, H. P. ; Bodermann, B. / Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 9132 SPIE, 2014.
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