Makyoh topography: A simple yet powerful optical method for flatness and defect characterisation of mirror-like surfaces

Research output: Contribution to journalConference article

26 Citations (Scopus)

Abstract

Makyoh topography is an optical surface defect and flatness characterisation tool. Its operation principle is based on the whole-field reflection of a collimated beam and defocused detection. This paper reviews the history, the basic principles and applications of the method. The problem of quantitativity is discussed in detail and the solutions are described. The accuracy limits are discussed. Application examples are shown from semiconductor wafer processing and MEMS technology. Comparison is made to related optical and other topographic techniques.

Original languageEnglish
Pages (from-to)86-100
Number of pages15
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5458
DOIs
Publication statusPublished - Dec 20 2004
EventOptical Micro- and Nanometrology in Manufacturing Technology - Strasbourg, France
Duration: Apr 29 2004Apr 30 2004

Keywords

  • Curvature measurements
  • Full-field optical characterisation techniques
  • Makyoh topography
  • MEMS
  • Surface defects
  • Surface flatness
  • Surface morphology

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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