Low temperature epitaxy of Au, Ag, Cu, and Al on (100), (110), and (111) NaCl

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Abstract

Water and chlorine treatment result in the low temperature epitaxial growth of vacuum deposited Au, Ag, and Cu on (100) surfaces of NaCl. Recent experiments confirmed the same effect of these surfactants on (110) and (111) NaCl surfaces down to a deposition temperature of 80°C. This proves that, regarding epitaxy (100) is not the only favoured orientation of NaCl. Orientation relationships of substrates and deposits are determined by selected area electron diffraction on in‐plane ion‐beam‐thinned samples. A strong chemical interaction between substrate, surfactant, and deposit is suggested promoting the epitaxy, and the possibility of compound formation is also considered. The deposition of Al under identical conditions as for Au, Ag, and Cu, results in the growth of polycrystalline films. However, low temperature epitaxial growth of (100), (110), and (111) Al is obtained by using an Ag underlayer.

Original languageEnglish
Pages (from-to)489-495
Number of pages7
Journalphysica status solidi (a)
Volume150
Issue number1
DOIs
Publication statusPublished - Jul 16 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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