Localization factor: A new parameter for the quantitative characterization of surface structure with atomic force microscopy (AFM)

Attila Bonyár, László Milán Molnár, Gábor Harsányi

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

In this work we present the possible application of a new parameter called localization factor for the quantitative characterization of surface structures with atomic force microscopy (AFM). For this purpose contact mode AFM images were taken from technologically different polycrystalline gold thin films and were evaluated according to the following parameters: surface roughness (R a, R RMS), roughness factor (f r) and localization factor. The localization factor was compared with the other surface parameters. We demonstrate that this new parameter can be used to identically characterize these gold thin film surfaces with contact mode AFM in the 1-1000μm 2 scan range. The mathematical background and possible application fields of the localization factor are also discussed in our paper.

Original languageEnglish
Pages (from-to)305-310
Number of pages6
JournalMicron
Volume43
Issue number2-3
DOIs
Publication statusPublished - Feb 1 2012

Keywords

  • AFM
  • Localization factor
  • Structural entropy
  • Surface roughness

ASJC Scopus subject areas

  • Structural Biology
  • Materials Science(all)
  • Physics and Astronomy(all)
  • Cell Biology

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