Line shape analysis of high energy X-ray induced Auger- and photoelectron spectra of thin Cu and Ni films

Wolfgang S.M. Werner, László Kövér, József Tóth, Dezsó Varga

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

A detailed study of the line shape of high energy Cu X-rays excited Auger- and photoelectron spectra of layered samples is presented. The samples consisted of polycrystalline Cu and Ni overlayers of various thicknesses deposited on a Si substrate. The raw data show that the contribution caused by bulk inelastic scattering in the spectra increases significantly with overlayer thickness. Employing a general deconvolution procedure, the contribution of bulk inelastic scattering was consistently eliminated. The resulting spectra are in excellent agreement. The contribution caused by surface excitations has a very moderate effect at these high energies, while intrinsic losses were estimated to make up ∼30-50% of the total intensity. The true energy distribution at the source as seen by the spectrometer was established by elimination of the features due to surface excitations and the contribution from intrinsic excitations of the delocalized electronic states was determined.

Original languageEnglish
Pages (from-to)103-114
Number of pages12
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume122
Issue number2
DOIs
Publication statusPublished - Feb 1 2002

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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