Limits of the scaled shift correction to levels of interstitial defects in semiconductors

P. Deák, Th Frauenheim, A. Gali

Research output: Contribution to journalArticle

14 Citations (Scopus)


The state-of-the-art method to calculate defect properties in semiconductors is density-functional theory (DFT) in a supercell geometry. Standard implementations of DFT, like the local density or the generalized gradient approximation, suffer from the underestimation of the band gap, which may lead to erroneous defect level positions. One possible remedy to this problem is the use of the scissor operator, originally introduced in the case of vacancies. Here we report a case study on interstitial hydrogen in silicon and silicon carbide, which shows that the scissor correction cannot always be applied successfully for interstitial defects and can cause significant errors, especially in wide-band-gap materials.

Original languageEnglish
Article number153204
JournalPhysical Review B - Condensed Matter and Materials Physics
Issue number15
Publication statusPublished - Apr 20 2007

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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