Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers

S. Charnovych, P. Nemec, V. Nazabal, A. Csik, M. Allix, G. Matzen, S. Kokenyesi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Photo induced changes in amorphous As20Se80/alumino- silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As20Se80 film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.

Original languageEnglish
Pages (from-to)1022-1025
Number of pages4
JournalMaterials Chemistry and Physics
Volume130
Issue number3
DOIs
Publication statusPublished - Nov 1 2011

Fingerprint

Aluminosilicates
silicates
Silicates
darkening
Free volume
Pulsed laser deposition
pulsed laser deposition
Energy gap
Lighting
illumination
aluminosilicate

Keywords

  • Amorphous chalcogenides
  • Nanomultilayers
  • Photo induced effects

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers. / Charnovych, S.; Nemec, P.; Nazabal, V.; Csik, A.; Allix, M.; Matzen, G.; Kokenyesi, S.

In: Materials Chemistry and Physics, Vol. 130, No. 3, 01.11.2011, p. 1022-1025.

Research output: Contribution to journalArticle

Charnovych, S. ; Nemec, P. ; Nazabal, V. ; Csik, A. ; Allix, M. ; Matzen, G. ; Kokenyesi, S. / Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers. In: Materials Chemistry and Physics. 2011 ; Vol. 130, No. 3. pp. 1022-1025.
@article{fcb86486a1dd48b4970d438f01f906e0,
title = "Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers",
abstract = "Photo induced changes in amorphous As20Se80/alumino- silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As20Se80 film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.",
keywords = "Amorphous chalcogenides, Nanomultilayers, Photo induced effects",
author = "S. Charnovych and P. Nemec and V. Nazabal and A. Csik and M. Allix and G. Matzen and S. Kokenyesi",
year = "2011",
month = "11",
day = "1",
doi = "10.1016/j.matchemphys.2011.08.028",
language = "English",
volume = "130",
pages = "1022--1025",
journal = "Materials Chemistry and Physics",
issn = "0254-0584",
publisher = "Elsevier BV",
number = "3",

}

TY - JOUR

T1 - Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers

AU - Charnovych, S.

AU - Nemec, P.

AU - Nazabal, V.

AU - Csik, A.

AU - Allix, M.

AU - Matzen, G.

AU - Kokenyesi, S.

PY - 2011/11/1

Y1 - 2011/11/1

N2 - Photo induced changes in amorphous As20Se80/alumino- silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As20Se80 film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.

AB - Photo induced changes in amorphous As20Se80/alumino- silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As20Se80 film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.

KW - Amorphous chalcogenides

KW - Nanomultilayers

KW - Photo induced effects

UR - http://www.scopus.com/inward/record.url?scp=80054043310&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80054043310&partnerID=8YFLogxK

U2 - 10.1016/j.matchemphys.2011.08.028

DO - 10.1016/j.matchemphys.2011.08.028

M3 - Article

VL - 130

SP - 1022

EP - 1025

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

SN - 0254-0584

IS - 3

ER -