Limiting of photo induced changes in amorphous chalcogenide/alumino- silicate nanomultilayers

S. Charnovych, P. Nemec, V. Nazabal, A. Csik, M. Allix, G. Matzen, S. Kokenyesi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Photo induced changes in amorphous As20Se80/alumino- silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As20Se80 film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.

Original languageEnglish
Pages (from-to)1022-1025
Number of pages4
JournalMaterials Chemistry and Physics
Volume130
Issue number3
DOIs
Publication statusPublished - Nov 1 2011

Keywords

  • Amorphous chalcogenides
  • Nanomultilayers
  • Photo induced effects

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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