Lateral growth rates in laser CVD of tungsten microstructures

T. Szörényi, K. Piglmayer, G. Q. Zhang, D. Bäuerle

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The lateral growth rates observed during the Kr+ laser-induced deposition of W spots from gaseous mixtures of WF6 and H2 have been analyzed on the basis of model calculations for pyrolytic laser-CVD. The apparent chemical activation energies derived for substrates of fused quartz (a-SiO2) covered either with 700 Å of sputtered W or with 1200 Å of amorphous Si (a-Si) are 30 and 40 kcal/mol, respectively.

Original languageEnglish
Pages (from-to)442-456
Number of pages15
JournalSurface Science
Volume202
Issue number3
DOIs
Publication statusPublished - Aug 2 1988

Fingerprint

Tungsten
Chemical vapor deposition
tungsten
vapor deposition
microstructure
Microstructure
Quartz
Lasers
lasers
quartz
Activation energy
Chemical activation
activation energy
Substrates

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Lateral growth rates in laser CVD of tungsten microstructures. / Szörényi, T.; Piglmayer, K.; Zhang, G. Q.; Bäuerle, D.

In: Surface Science, Vol. 202, No. 3, 02.08.1988, p. 442-456.

Research output: Contribution to journalArticle

Szörényi, T. ; Piglmayer, K. ; Zhang, G. Q. ; Bäuerle, D. / Lateral growth rates in laser CVD of tungsten microstructures. In: Surface Science. 1988 ; Vol. 202, No. 3. pp. 442-456.
@article{cd522d34967044f18ff278cc77b6a639,
title = "Lateral growth rates in laser CVD of tungsten microstructures",
abstract = "The lateral growth rates observed during the Kr+ laser-induced deposition of W spots from gaseous mixtures of WF6 and H2 have been analyzed on the basis of model calculations for pyrolytic laser-CVD. The apparent chemical activation energies derived for substrates of fused quartz (a-SiO2) covered either with 700 {\AA} of sputtered W or with 1200 {\AA} of amorphous Si (a-Si) are 30 and 40 kcal/mol, respectively.",
author = "T. Sz{\"o}r{\'e}nyi and K. Piglmayer and Zhang, {G. Q.} and D. B{\"a}uerle",
year = "1988",
month = "8",
day = "2",
doi = "10.1016/0039-6028(88)90046-5",
language = "English",
volume = "202",
pages = "442--456",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - Lateral growth rates in laser CVD of tungsten microstructures

AU - Szörényi, T.

AU - Piglmayer, K.

AU - Zhang, G. Q.

AU - Bäuerle, D.

PY - 1988/8/2

Y1 - 1988/8/2

N2 - The lateral growth rates observed during the Kr+ laser-induced deposition of W spots from gaseous mixtures of WF6 and H2 have been analyzed on the basis of model calculations for pyrolytic laser-CVD. The apparent chemical activation energies derived for substrates of fused quartz (a-SiO2) covered either with 700 Å of sputtered W or with 1200 Å of amorphous Si (a-Si) are 30 and 40 kcal/mol, respectively.

AB - The lateral growth rates observed during the Kr+ laser-induced deposition of W spots from gaseous mixtures of WF6 and H2 have been analyzed on the basis of model calculations for pyrolytic laser-CVD. The apparent chemical activation energies derived for substrates of fused quartz (a-SiO2) covered either with 700 Å of sputtered W or with 1200 Å of amorphous Si (a-Si) are 30 and 40 kcal/mol, respectively.

UR - http://www.scopus.com/inward/record.url?scp=0000334385&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000334385&partnerID=8YFLogxK

U2 - 10.1016/0039-6028(88)90046-5

DO - 10.1016/0039-6028(88)90046-5

M3 - Article

AN - SCOPUS:0000334385

VL - 202

SP - 442

EP - 456

JO - Surface Science

JF - Surface Science

SN - 0039-6028

IS - 3

ER -