Laser-induced etching and deposition of tungsten in WF6-H2 atmosphere

K. Piglmayer, Z. Tóth, Z. Kantor

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Combined thermally induced etching and deposition of W in a mixture of WF6 and H2 is investigated by local laser-induced patterning of thin tungsten layers on quartz. The process divides into areas of pure etching and deposition, depending on the partial pressures of the gases.

Original languageEnglish
Pages (from-to)484-487
Number of pages4
JournalApplied Surface Science
Volume86
Issue number1-4
DOIs
Publication statusPublished - 1995

Fingerprint

Tungsten
Etching
tungsten
etching
atmospheres
Quartz
Lasers
Partial pressure
lasers
partial pressure
quartz
Gases
gases

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physical and Theoretical Chemistry
  • Condensed Matter Physics

Cite this

Laser-induced etching and deposition of tungsten in WF6-H2 atmosphere. / Piglmayer, K.; Tóth, Z.; Kantor, Z.

In: Applied Surface Science, Vol. 86, No. 1-4, 1995, p. 484-487.

Research output: Contribution to journalArticle

Piglmayer, K. ; Tóth, Z. ; Kantor, Z. / Laser-induced etching and deposition of tungsten in WF6-H2 atmosphere. In: Applied Surface Science. 1995 ; Vol. 86, No. 1-4. pp. 484-487.
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