Laser direct writing of tin oxide patterns

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Tin oxide pattern generation by laser deposition from SnCl4·5H2O in isopropanol is reported. Smooth, even stripes of thicknesses ranging from 20 to 120 nm with sharp, well defined edges and cross-section are deposited by scanning Ar+ laser beam (λ = 514.5 nm) focused onto the substrate - solution interface with a constant speed of 1 mm s-1. The linewidth linearly increases from 26 to 42 μm with increasing the power from 40 to 120 mW. The reproducibility of pattern generation is extremely good as revealed by SEM-EDXI and μRBS. The minimum DC resistivity of 1.7×10-2 Ωcm, measured without any process optimization, favourably compares with those reported for films prepared by other techniques. The chemical composition of the film material is SnOx with 1.1 < × < 1.5 as determined by an XPS-XAES study.

Original languageEnglish
Pages (from-to)327-329
Number of pages3
Issue number3-4
Publication statusPublished - Jul 1 1998


ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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