Laser-assisted atomic layer deposition of boron nitride thin films

Jenny Olander, L. Mikael Ottosson, P. Heszler, Jan Oho Carlsson, Karin M E Larsson

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Boron nitride thin films have been grown by both laser-assisted, and conventional atomic layer deposition (LALD/ALD) at temperatures in the range 250-750°C. Both the NH3 and BBr3 precursors were appreciably dissociated by the ArF excimer laser, and up to 600°C, the growth rate was 100% higher for the LALD process than for ALD. The films consisted of hydrogen-terminated turbostratic BN grains. H2 was theoretically found to bind as strongly as BBrx and NHx (X=0-2) to hBN(100) edges. The fresh films were stoichiometric with respect to B and N, and contained low degrees of contamination, but oxidized easily in air.

Original languageEnglish
Pages (from-to)330-337
Number of pages8
JournalChemical Vapor Deposition
Volume11
Issue number6-7
DOIs
Publication statusPublished - Jul 2005

Fingerprint

Atomic layer deposition
Boron nitride
boron nitrides
atomic layer epitaxy
Thin films
Lasers
Excimer lasers
thin films
excimer lasers
lasers
Hydrogen
contamination
Contamination
air
hydrogen
Air
Temperature
temperature
boron nitride

Keywords

  • Ab initio calculations
  • ALD
  • Boron nitride
  • LALD
  • Laser irradiation

ASJC Scopus subject areas

  • Electrochemistry
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Olander, J., Ottosson, L. M., Heszler, P., Carlsson, J. O., & Larsson, K. M. E. (2005). Laser-assisted atomic layer deposition of boron nitride thin films. Chemical Vapor Deposition, 11(6-7), 330-337. https://doi.org/10.1002/cvde.200506365

Laser-assisted atomic layer deposition of boron nitride thin films. / Olander, Jenny; Ottosson, L. Mikael; Heszler, P.; Carlsson, Jan Oho; Larsson, Karin M E.

In: Chemical Vapor Deposition, Vol. 11, No. 6-7, 07.2005, p. 330-337.

Research output: Contribution to journalArticle

Olander, J, Ottosson, LM, Heszler, P, Carlsson, JO & Larsson, KME 2005, 'Laser-assisted atomic layer deposition of boron nitride thin films', Chemical Vapor Deposition, vol. 11, no. 6-7, pp. 330-337. https://doi.org/10.1002/cvde.200506365
Olander, Jenny ; Ottosson, L. Mikael ; Heszler, P. ; Carlsson, Jan Oho ; Larsson, Karin M E. / Laser-assisted atomic layer deposition of boron nitride thin films. In: Chemical Vapor Deposition. 2005 ; Vol. 11, No. 6-7. pp. 330-337.
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