Large area silica films deposited on silicon substrates by a CO2 laser

T. Szörényi, Pio Gonzalez, Dolores Fernandez, Juan Pou, Betty Leon, Mariano Perez-Amor

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Conventional (thermal) CVD of SiO2 is a well established method widely used e.g. in the microelectronic industry. Recognizing the big success of CO2 laser induced CVD in depositing high quality amorphous silicon (a-Si) films from silane it is quite surprising that - to the best of our knowledge- there has been no report on a-SiO2 thin film deposition initiated by a cw CO2 laser in parallel configuration. In this contribution we report the first results of a systematic study on cw CO2 laser induced CVD of silicon oxide films onto silicon wafers from SiH4 / N2O / Ar gas mixtures in parallel configuration in comparison with similar experiments for a-Si film formation. Gas mixture absorption behaviour and total pressure rise under laser irradiation demonstrate that the SiO2 production can be due to homogeneous gas heating similar to the a-Si:H deposition. The films deposited are characterized by IR transmission spectroscopy. The fact that well adhering silicon oxide films can be produced with reasonable growth rates by using a simple and inexpensive laser makes this method attractive for industrial applications.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsLucien D. Laude
PublisherPubl by Int Soc for Optical Engineering
Pages144-149
Number of pages6
Volume1279
ISBN (Print)0819403261
Publication statusPublished - 1990
EventLaser-Assisted Processing II - Hague, Neth
Duration: Mar 13 1990Mar 14 1990

Other

OtherLaser-Assisted Processing II
CityHague, Neth
Period3/13/903/14/90

Fingerprint

Amorphous silicon
Silica
silicon dioxide
Chemical vapor deposition
Silicon
Lasers
Silicon oxides
amorphous silicon
silicon
Substrates
Gas mixtures
Oxide films
lasers
vapor deposition
silicon films
silicon oxides
gas mixtures
Gas heating
oxide films
Infrared transmission

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Szörényi, T., Gonzalez, P., Fernandez, D., Pou, J., Leon, B., & Perez-Amor, M. (1990). Large area silica films deposited on silicon substrates by a CO2 laser. In L. D. Laude (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1279, pp. 144-149). Publ by Int Soc for Optical Engineering.

Large area silica films deposited on silicon substrates by a CO2 laser. / Szörényi, T.; Gonzalez, Pio; Fernandez, Dolores; Pou, Juan; Leon, Betty; Perez-Amor, Mariano.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Lucien D. Laude. Vol. 1279 Publ by Int Soc for Optical Engineering, 1990. p. 144-149.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Szörényi, T, Gonzalez, P, Fernandez, D, Pou, J, Leon, B & Perez-Amor, M 1990, Large area silica films deposited on silicon substrates by a CO2 laser. in LD Laude (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1279, Publ by Int Soc for Optical Engineering, pp. 144-149, Laser-Assisted Processing II, Hague, Neth, 3/13/90.
Szörényi T, Gonzalez P, Fernandez D, Pou J, Leon B, Perez-Amor M. Large area silica films deposited on silicon substrates by a CO2 laser. In Laude LD, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1279. Publ by Int Soc for Optical Engineering. 1990. p. 144-149
Szörényi, T. ; Gonzalez, Pio ; Fernandez, Dolores ; Pou, Juan ; Leon, Betty ; Perez-Amor, Mariano. / Large area silica films deposited on silicon substrates by a CO2 laser. Proceedings of SPIE - The International Society for Optical Engineering. editor / Lucien D. Laude. Vol. 1279 Publ by Int Soc for Optical Engineering, 1990. pp. 144-149
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