Large area silica films deposited on silicon substrates by a CO2 laser

Tamas Szorenyi, Pio Gonzalez, Dolores Fernandez, Juan Pou, Betty Leon, Mariano Perez-Amor

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Conventional (thermal) CVD of SiO2 is a well established method widely used e.g. in the microelectronic industry. Recognizing the big success of CO2 laser induced CVD in depositing high quality amorphous silicon (a-Si) films from silane it is quite surprising that - to the best of our knowledge- there has been no report on a-SiO2 thin film deposition initiated by a cw CO2 laser in parallel configuration. In this contribution we report the first results of a systematic study on cw CO2 laser induced CVD of silicon oxide films onto silicon wafers from SiH4 / N2O / Ar gas mixtures in parallel configuration in comparison with similar experiments for a-Si film formation. Gas mixture absorption behaviour and total pressure rise under laser irradiation demonstrate that the SiO2 production can be due to homogeneous gas heating similar to the a-Si:H deposition. The films deposited are characterized by IR transmission spectroscopy. The fact that well adhering silicon oxide films can be produced with reasonable growth rates by using a simple and inexpensive laser makes this method attractive for industrial applications.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsLucien D. Laude
PublisherPubl by Int Soc for Optical Engineering
Pages144-149
Number of pages6
ISBN (Print)0819403261
Publication statusPublished - Dec 1 1990
EventLaser-Assisted Processing II - Hague, Neth
Duration: Mar 13 1990Mar 14 1990

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1279
ISSN (Print)0277-786X

Other

OtherLaser-Assisted Processing II
CityHague, Neth
Period3/13/903/14/90

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Szorenyi, T., Gonzalez, P., Fernandez, D., Pou, J., Leon, B., & Perez-Amor, M. (1990). Large area silica films deposited on silicon substrates by a CO2 laser. In L. D. Laude (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (pp. 144-149). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 1279). Publ by Int Soc for Optical Engineering.