K‐Shell Auger transitions induced by Mo x‐rays

L. Kövér, A. Némethy, I. Cserny, D. Varga

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

For exciting K‐Auger transitions of elements with atomic number between 13 and 26, Mo x‐rays (Mo bremsstrahlung + Mo Lα,β) from a high voltage (max. 30 kV) source were used. High‐resolution K‐Auger spectra were measured by the help of a high luminosity hemispherical electron spectrometer. Spectral intensities obtained using the Mo x‐ray source are compared to the respective intensities measured using an Al anode and source parameters usual for electron spectrometers. The attainable gain in Auger yields is between 2 and 15 for most elements investigated and reaches a factor of 20.5 in the case of P KLL. Optimum conditions of K‐Auger excitation (regarding the atomic number region mentioned) are also discussed. As an example for applications, the phosphorus K‐Auger parameter has been determined for GaP, taking an advantage of the presence of the P 1s (Mo Lα) photoelectron line in the spectra excited by Mo x‐rays. The higher analytical sensitivity, attainable by measuring Mo x‐ray‐induced P KLL Auger electrons compared to the sensitivity of the conventional XPS (Al Kα excited P 2p), is demonstrated in the case of a phosphoric compound (corrosion inhibitor) adsorbed on a polycrystalline Fe surface.

Original languageEnglish
Pages (from-to)659-665
Number of pages7
JournalSurface and Interface Analysis
Volume20
Issue number8
DOIs
Publication statusPublished - Jul 1993

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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