Kinetic pattern formation of Gd-silicide films in lateral growth geometry

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The solid phase reaction of gadolinium thin film and silicon substrate was investigated in lateral growth geometry with the help of periodic titanium protective stripes by optical microscopy. In the lateral reaction zone the shape of the interface between gadolinium and Gd silicide was very complicated and showed pattern formation. This silicide growth can be described as a kinetic process modified by the structure of the Gd film in contrast to the previously proposed simple nucleation.

Original languageEnglish
Pages (from-to)1679-1680
Number of pages2
JournalApplied Physics Letters
Volume64
Issue number13
DOIs
Publication statusPublished - 1994

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gadolinium
kinetics
geometry
solid phases
titanium
nucleation
microscopy
silicon
thin films

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Kinetic pattern formation of Gd-silicide films in lateral growth geometry. / Molnár, G.; Pető, G.; Horváth, Z.; Zsoldos, E.

In: Applied Physics Letters, Vol. 64, No. 13, 1994, p. 1679-1680.

Research output: Contribution to journalArticle

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