Ion induced reactions in Fe/Al bilayers by pulsed-beam ion irradiation and Xe implantation

M. Nastasi, R. Fastow, J. Gyulai, J. W. Mayer, S. J. Plimpton, E. D. Wolf, B. Manfred Ullrich

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Bilayers of Fe/Al have been used to contrast two types of irradiations, pulsed-beam and conventional implantation. The Fe/Al bilayers were reacted with ∼ 70 ns, 280 keV light ion pulsed-beam irradiation and 550 keV Xe ion implantation. Rutherford backscattering spectrometry and electron and X-ray diffraction data reveal that pulsed beam irradiation results in substantially larger interface reactions compared to Xe implantation. Monte Carlo simulations indicate that the reactions observed in the pulsed-beam irradiated Fe/Al do not stem from nuclear cascade mixing and heating. These reactions are the result of lattice heating which occurs when the energy deposited into the electronic system of the Fe/Al is coupled to the lattice. Heat flow calculations have indicated that the irradiation induced lattice heating causes rises in the surface temperature and the melting of Al.

Original languageEnglish
Pages (from-to)585-590
Number of pages6
JournalNuclear Inst. and Methods in Physics Research, B
Issue numberPART 2
Publication statusPublished - Mar 1985


ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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