Ion-induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin films

L. S. Hung, M. Nastasi, J. Gyulai, J. W. Mayer

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Abstract

Amorphization by ion beam irradiation of multilayered samples of Al/Pt, Al/Pd, and Al/Ni has been investigated by selected area diffraction and Rutherford backscattering. With a dose of 2×1014 Xe ions/cm2, uniform mixing is achieved in the Al/Pt system and the amorphous phase is produced over a large composition range. In the Al/Pd and Al/Ni systems, amorphous phases or the equilibrium, crystalline phases are formed depending on the composition of the films. The same results were found when the samples were annealed to form crystalline phases before bombardment. For thin films of these fcc metals, only the simplest intermetallics, NiAl and PdAl, (primitive cubic structures with 2 atoms/cell) were formed in crystalline form by ion-beam irradiation.

Original languageEnglish
Pages (from-to)672-674
Number of pages3
JournalApplied Physics Letters
Volume42
Issue number8
DOIs
Publication statusPublished - Dec 1 1983

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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