The initial stages of oxidation of thin evaporated film and of diamond-polished and electropolished bulk aluminum were investigated by SIMS. The highest ratio between the AIO** plus ion yield at oxygen coverage theta equals 0. 13 and zero exposure was observed in the case of the thin film sample; moreover, for the diamond-polished sample this ratio was higher than for the electropolished one. The Al** plus ion yield was found to depend on the oxygen uptake and to show a linear function in the range of the oxygen doses applied. Calculations were carried out in connection with the sputtering yields of the three differently prepared samples using the ion yield values obtained. The difference between the samples analyzed is ascribed to the different oxide content of their surface layers.
|Number of pages||3|
|Journal||Surface and Interface Analysis|
|Publication status||Published - Aug 1979|
ASJC Scopus subject areas
- Colloid and Surface Chemistry
- Physical and Theoretical Chemistry