Investigation of the effect of altered defect structure produced by photon assisted implantation on the diffusion of As in silicon during thermal annealing

L. P. Biró, J. Gyulai, S. Bogen, L. Frey, H. Ryssel

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)925-928
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, B
Issue number1-4
Publication statusPublished - Mar 2 1994

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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