Investigation of ruthenium deposition onto a platinum electrode in hydrochloric acid media

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Abstract

Ruthenium deposition onto the Pt surface has been investigated in 0.5 M HCl and it was shown that the Ru coverage formed via ionization of pre-adsorbed hydrogen does not depend on the Cl- ion activity. It is strongly dependent, however, if the deposition is carried out at a rather positive potential. The ratio of hydrogen adsorbed on Ru and Pt surfaces of the same area (HRua/HPta = 0.15) and the site requirement of an adsorbed Ru atom (S = 1.8) have been determined. A mechanism for Ru deposition via ionization of hydrogen adsorbed on platinized Pt is proposed and it is suggested that the Run+ + ne- → Ru process is slow compared to transport processes and adsorption.

Original languageEnglish
Pages (from-to)269-277
Number of pages9
JournalJournal of Electroanalytical Chemistry
Volume271
Issue number1-2
DOIs
Publication statusPublished - 1989

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

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