Investigation of ruthenium deposition onto a platinized platinum electrode in sulfuric acid media

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Ruthenium deposition onto platinized Pt electrode in 0.5 M H2SO4 solution is investigated. The I-V profiles of the Pt electrode covered with Ru depend on the potential of Ru deposition. This phenomenon is explained by the increasing degree of oxidation of the Ru layers deposited at higher potentials. Oxidation of Ru deposited at low potentials begins with comparatively slow processes. A mechanism for Ru deposition via ionization of hydrogen adsorbed on platinized Pt electrode is proposed.

Original languageEnglish
Pages (from-to)233-240
Number of pages8
JournalJournal of Electroanalytical Chemistry
Issue number1-2
Publication statusPublished - Aug 25 1987


ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

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