INVESTIGATION OF PLASMA EFFECT ON EBIC DISLOCATION CONTRAST IN Si.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Sample bias dependent EBIC dislocation contrast measurements revealed 3 characteristic parts of the contrast/bias curve with different origins (drift, diffusion and plasma). The existence of electron-hole plasma, and its influence on dislocation contrast was proved by simultaneous plasma loss/bias measurements.

Original languageEnglish
Title of host publicationInstitute of Physics Conference Series
Pages361-364
Number of pages4
Edition76
Publication statusPublished - Dec 1 1985

Publication series

NameInstitute of Physics Conference Series
Number76
ISSN (Print)0373-0751

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Toth, A. L. (1985). INVESTIGATION OF PLASMA EFFECT ON EBIC DISLOCATION CONTRAST IN Si. In Institute of Physics Conference Series (76 ed., pp. 361-364). (Institute of Physics Conference Series; No. 76).