Inverted fractal analysis of TiOx thin layers grown by inverse pulsed laser deposition

L. Égerházi, T. Smausz, F. Bari

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Inverted fractal analysis (IFA), a method developed for fractal analysis of scanning electron microscopy images of cauliflower-like thin films is presented through the example of layers grown by inverse pulsed laser deposition (IPLD). IFA uses the integrated fractal analysis module (FracLac) of the image processing software ImageJ, and an objective thresholding routine that preserves the characteristic features of the images, independently of their brightness and contrast. IFA revealed fD = 1.83 ± 0.01 for TiO x layers grown at 5-50 Pa background pressures. For a series of images, this result was verified by evaluating the scaling of the number of still resolved features on the film, counted manually. The value of f D not only confirms the fractal structure of TiOx IPLD thin films, but also suggests that the aggregation of plasma species in the gas atmosphere may have only limited contribution to the deposition.

Original languageEnglish
Pages (from-to)106-110
Number of pages5
JournalApplied Surface Science
Volume278
DOIs
Publication statusPublished - Aug 1 2013

Fingerprint

Pulsed laser deposition
Fractals
Thin films
Luminance
Image processing
Agglomeration
Gases
Plasmas
Scanning electron microscopy

Keywords

  • Fractal analysis
  • Greyscale
  • Inverse pulsed laser deposition
  • Scanning electron microscopy
  • Thresholding
  • Titanium-oxide

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Inverted fractal analysis of TiOx thin layers grown by inverse pulsed laser deposition. / Égerházi, L.; Smausz, T.; Bari, F.

In: Applied Surface Science, Vol. 278, 01.08.2013, p. 106-110.

Research output: Contribution to journalArticle

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