Intrinsic and extrinsic contributions to plasmon excitations in electron emission processes

J. L. Gervasoni, L. Kövér

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

In this work, we study in detail the process of excitation of bulk and surface plasmons during the emission of electrons in the proximity of a solid surface. We take into account the effects due to electron transport (extrinsic contributions) and residual hole (intrinsic contributions). We use the dielectric response theory and the specular reflection model. The results obtained for Al metal illustrate that, depending on the distance from the surface, the separation of extrinsic and intrinsic contributions could be ambiguous because of interference effects between the photoelectron and the photohole present in both processes.

Original languageEnglish
Pages (from-to)652-656
Number of pages5
JournalSurface and Interface Analysis
Volume38
Issue number4
DOIs
Publication statusPublished - Apr 1 2006

Keywords

  • Electron emission
  • Plasmon excitations

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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