Abstract
An integrated lithography method is presented to prepare rounded nano-objects with variable shape, in arrays with arbitrary symmetry and wavelength-scaled periodicity. Finite element method was applied to determine the near-field confinement under monolayers of silver and gold colloid spheres illuminated by circularly polarized beams possessing periodic intensity distribution, and to predict the shape of nano-objects, which can be fabricated on thin noble metal layers on glass substrates. It was shown that illumination by perpendicularly incident homogeneous beam results in hexagonal array of uniform nano-rings, while uniform nano-crescents appear due to single obliquely incident beam. Illumination of colloid sphere monolayers by interfering beams causes development of co-existent nano-rings and nanocrescents. It was demonstrated that the periodicity of complex patterns is determined by the wavelength and angle of incidence; the inter-object distance is controlled by the relative orientation of interference patterns with respect to colloid sphere monolayers; the nano-object size is determined by the wavelength, sphere diameter and material; while the nearfield distribution sensitively depends on the direction of illumination by circularly polarized light. We present complex patterns of various rounded nano-objects that can be uniquely fabricated via Circular Integrated Interference and Colloid sphere Lithography (CIICL), and applied as plasmonic and meta-materials.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Publisher | SPIE |
| Volume | 8323 |
| ISBN (Print) | 9780819489791 |
| DOIs | |
| Publication status | Published - 2012 |
| Event | Alternative Lithographic Technologies IV - San Jose, CA, United States Duration: Feb 13 2012 → Feb 16 2012 |
Other
| Other | Alternative Lithographic Technologies IV |
|---|---|
| Country | United States |
| City | San Jose, CA |
| Period | 2/13/12 → 2/16/12 |
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Keywords
- circularly polarized light
- complex plasmonic structures
- integrated interference and colloid sphere lithography
ASJC Scopus subject areas
- Applied Mathematics
- Computer Science Applications
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
Cite this
Integrated lithography to prepare arrays of rounded nano-objects. / Sipos, Áron; Szalai, Anikó; Csete, M.
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8323 SPIE, 2012. 83232E.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Integrated lithography to prepare arrays of rounded nano-objects
AU - Sipos, Áron
AU - Szalai, Anikó
AU - Csete, M.
PY - 2012
Y1 - 2012
N2 - An integrated lithography method is presented to prepare rounded nano-objects with variable shape, in arrays with arbitrary symmetry and wavelength-scaled periodicity. Finite element method was applied to determine the near-field confinement under monolayers of silver and gold colloid spheres illuminated by circularly polarized beams possessing periodic intensity distribution, and to predict the shape of nano-objects, which can be fabricated on thin noble metal layers on glass substrates. It was shown that illumination by perpendicularly incident homogeneous beam results in hexagonal array of uniform nano-rings, while uniform nano-crescents appear due to single obliquely incident beam. Illumination of colloid sphere monolayers by interfering beams causes development of co-existent nano-rings and nanocrescents. It was demonstrated that the periodicity of complex patterns is determined by the wavelength and angle of incidence; the inter-object distance is controlled by the relative orientation of interference patterns with respect to colloid sphere monolayers; the nano-object size is determined by the wavelength, sphere diameter and material; while the nearfield distribution sensitively depends on the direction of illumination by circularly polarized light. We present complex patterns of various rounded nano-objects that can be uniquely fabricated via Circular Integrated Interference and Colloid sphere Lithography (CIICL), and applied as plasmonic and meta-materials.
AB - An integrated lithography method is presented to prepare rounded nano-objects with variable shape, in arrays with arbitrary symmetry and wavelength-scaled periodicity. Finite element method was applied to determine the near-field confinement under monolayers of silver and gold colloid spheres illuminated by circularly polarized beams possessing periodic intensity distribution, and to predict the shape of nano-objects, which can be fabricated on thin noble metal layers on glass substrates. It was shown that illumination by perpendicularly incident homogeneous beam results in hexagonal array of uniform nano-rings, while uniform nano-crescents appear due to single obliquely incident beam. Illumination of colloid sphere monolayers by interfering beams causes development of co-existent nano-rings and nanocrescents. It was demonstrated that the periodicity of complex patterns is determined by the wavelength and angle of incidence; the inter-object distance is controlled by the relative orientation of interference patterns with respect to colloid sphere monolayers; the nano-object size is determined by the wavelength, sphere diameter and material; while the nearfield distribution sensitively depends on the direction of illumination by circularly polarized light. We present complex patterns of various rounded nano-objects that can be uniquely fabricated via Circular Integrated Interference and Colloid sphere Lithography (CIICL), and applied as plasmonic and meta-materials.
KW - circularly polarized light
KW - complex plasmonic structures
KW - integrated interference and colloid sphere lithography
UR - http://www.scopus.com/inward/record.url?scp=84878563290&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84878563290&partnerID=8YFLogxK
U2 - 10.1117/12.916403
DO - 10.1117/12.916403
M3 - Conference contribution
AN - SCOPUS:84878563290
SN - 9780819489791
VL - 8323
BT - Proceedings of SPIE - The International Society for Optical Engineering
PB - SPIE
ER -