Integrated lithography to prepare arrays of rounded nano-objects

Áron Sipos, Anikó Szalai, M. Csete

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

An integrated lithography method is presented to prepare rounded nano-objects with variable shape, in arrays with arbitrary symmetry and wavelength-scaled periodicity. Finite element method was applied to determine the near-field confinement under monolayers of silver and gold colloid spheres illuminated by circularly polarized beams possessing periodic intensity distribution, and to predict the shape of nano-objects, which can be fabricated on thin noble metal layers on glass substrates. It was shown that illumination by perpendicularly incident homogeneous beam results in hexagonal array of uniform nano-rings, while uniform nano-crescents appear due to single obliquely incident beam. Illumination of colloid sphere monolayers by interfering beams causes development of co-existent nano-rings and nanocrescents. It was demonstrated that the periodicity of complex patterns is determined by the wavelength and angle of incidence; the inter-object distance is controlled by the relative orientation of interference patterns with respect to colloid sphere monolayers; the nano-object size is determined by the wavelength, sphere diameter and material; while the nearfield distribution sensitively depends on the direction of illumination by circularly polarized light. We present complex patterns of various rounded nano-objects that can be uniquely fabricated via Circular Integrated Interference and Colloid sphere Lithography (CIICL), and applied as plasmonic and meta-materials.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume8323
ISBN (Print)9780819489791
DOIs
Publication statusPublished - 2012
EventAlternative Lithographic Technologies IV - San Jose, CA, United States
Duration: Feb 13 2012Feb 16 2012

Other

OtherAlternative Lithographic Technologies IV
CountryUnited States
CitySan Jose, CA
Period2/13/122/16/12

Fingerprint

Lithography
Colloids
lithography
colloids
Illumination
Monolayers
Lighting
illumination
Wavelength
Near-field
Periodicity
periodic variations
Interference
Crescent
wavelengths
interference
Ring
Gold Colloid
Metamaterials
rings

Keywords

  • circularly polarized light
  • complex plasmonic structures
  • integrated interference and colloid sphere lithography

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Sipos, Á., Szalai, A., & Csete, M. (2012). Integrated lithography to prepare arrays of rounded nano-objects. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 8323). [83232E] SPIE. https://doi.org/10.1117/12.916403

Integrated lithography to prepare arrays of rounded nano-objects. / Sipos, Áron; Szalai, Anikó; Csete, M.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8323 SPIE, 2012. 83232E.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sipos, Á, Szalai, A & Csete, M 2012, Integrated lithography to prepare arrays of rounded nano-objects. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 8323, 83232E, SPIE, Alternative Lithographic Technologies IV, San Jose, CA, United States, 2/13/12. https://doi.org/10.1117/12.916403
Sipos Á, Szalai A, Csete M. Integrated lithography to prepare arrays of rounded nano-objects. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8323. SPIE. 2012. 83232E https://doi.org/10.1117/12.916403
Sipos, Áron ; Szalai, Anikó ; Csete, M. / Integrated lithography to prepare arrays of rounded nano-objects. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8323 SPIE, 2012.
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