Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films

Mikhail Chubarov, Henrik Pedersen, Hans Högberg, Anne Henry, Z. Czigány

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Knowledge of the structural evolution of thin films, starting by the initial stages of growth, is important to control the quality and properties of the film. The authors present a study on the initial stages of growth and the temperature influence on the structural evolution of sp2 hybridized boron nitride (BN) thin films during chemical vapor deposition (CVD) with triethyl boron and ammonia as precursors. Nucleation of hexagonal BN (h-BN) occurs at 1200 °C on α-Al2O3 with an AlN buffer layer (AlN/α-Al2O3). At 1500 °C, h-BN grows with a layer-by-layer growth mode on AlN/α-Al2O3 up to ∼4 nm after which the film structure changes to rhombohedral BN (r-BN). Then, r-BN growth proceeds with a mixed layer-by-layer and island growth mode. h-BN does not grow on 6H-SiC substrates; instead, r-BN nucleates and grows directly with a mixed layer-by-layer and island growth mode. These differences may be caused by differences in substrate surface temperature due to different thermal conductivities of the substrate materials. These results add to the understanding of the growth process of sp2-BN employing CVD.

Original languageEnglish
Article number061520
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume33
Issue number6
DOIs
Publication statusPublished - Nov 1 2015

Fingerprint

Boron nitride
boron nitrides
Chemical vapor deposition
vapor deposition
Temperature
temperature
Substrates
Thin films
Boron
Buffer layers
thin films
boron nitride
Ammonia
surface temperature
ammonia
Thermal conductivity
boron
Nucleation
thermal conductivity
buffers

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films. / Chubarov, Mikhail; Pedersen, Henrik; Högberg, Hans; Henry, Anne; Czigány, Z.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 33, No. 6, 061520, 01.11.2015.

Research output: Contribution to journalArticle

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