Influence on the laser induced backside dry etching of thickness and material of the absorber, laser spot size and multipulse irradiation

T. Smausz, T. Csizmadia, N. Kresz, Cs Vass, Zs Márton, B. Hopp

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Laser induced backside dry etching method (LIBDE) was developed - analogously to the well-known laser induced backside wet etching (LIBWE) technique - for the micromachining of transparent materials. In this procedure, the absorbing liquid applied during LIBWE was replaced with solid metal layers. Fused silica plates were used as transparent targets. These were coated with 15-120 nm thick layers of different metals (silver, aluminium and copper). The absorbing films were irradiated by a nanosecond KrF excimer laser beam through the quartz plate. The applied fluence was varied in the 150-2000 mJ/cm 2 range, while the irradiated area was between 0.35 and 3.6 mm 2 . At fluences above the threshold values, it was found that the metal layers were removed from the irradiated spots and the fused silica was etched at the same time. In our experiments, we investigated the dependence of the main parameters (etch rate and threshold) of LIBDE on the absorption of the different metal layers (silver, copper, aluminium), on the size of the irradiated area, on the film thickness and on the number of processing laser pulses.

Original languageEnglish
Pages (from-to)1091-1095
Number of pages5
JournalApplied Surface Science
Issue number4
Publication statusPublished - Dec 15 2007



  • Dry etching
  • Excimer laser
  • Fused silica
  • Microprocessing
  • Thin film absorber
  • Transparent material

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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