Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition

E. Fogarassy, T. Szörényi, F. Antoni, J. P. Stoquert, G. Pirio, J. Olivier, P. Legagneux, P. Boher, O. Pons-Y-Moll

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Amorphous carbon nitride (a-CNx) films were grown on silicon substrates by ArF excimer laser ablation of a graphite target in the presence of nitrogen at various gas pressures. By working at elevated pressures (up to 100 Pa), high amounts of nitrogen can be incorporated into the films (N/C ≤ 0.4) which lead to strong enhancement of their field emission properties. This behaviour was demonstrated to be mainly related to changes in the surface roughness of the samples, in connection with the development of graphite-like structures.

Original languageEnglish
Pages (from-to)316-320
Number of pages5
JournalApplied Surface Science
Volume197-198
DOIs
Publication statusPublished - 2002

Fingerprint

Graphite
Pulsed laser deposition
Field emission
pulsed laser deposition
field emission
Nitrogen
graphite
nitrogen
carbon nitrides
Carbon nitride
Amorphous carbon
Excimer lasers
Silicon
Laser ablation
excimer lasers
laser ablation
gas pressure
surface roughness
Gases
Surface roughness

Keywords

  • Carbon
  • Field emission
  • Nitrogen
  • Pulsed laser deposition
  • Surface roughness

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition. / Fogarassy, E.; Szörényi, T.; Antoni, F.; Stoquert, J. P.; Pirio, G.; Olivier, J.; Legagneux, P.; Boher, P.; Pons-Y-Moll, O.

In: Applied Surface Science, Vol. 197-198, 2002, p. 316-320.

Research output: Contribution to journalArticle

Fogarassy, E, Szörényi, T, Antoni, F, Stoquert, JP, Pirio, G, Olivier, J, Legagneux, P, Boher, P & Pons-Y-Moll, O 2002, 'Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition', Applied Surface Science, vol. 197-198, pp. 316-320. https://doi.org/10.1016/S0169-4332(02)00389-6
Fogarassy, E. ; Szörényi, T. ; Antoni, F. ; Stoquert, J. P. ; Pirio, G. ; Olivier, J. ; Legagneux, P. ; Boher, P. ; Pons-Y-Moll, O. / Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition. In: Applied Surface Science. 2002 ; Vol. 197-198. pp. 316-320.
@article{847f0b23692a480aa5b114d11b9e8fe8,
title = "Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition",
abstract = "Amorphous carbon nitride (a-CNx) films were grown on silicon substrates by ArF excimer laser ablation of a graphite target in the presence of nitrogen at various gas pressures. By working at elevated pressures (up to 100 Pa), high amounts of nitrogen can be incorporated into the films (N/C ≤ 0.4) which lead to strong enhancement of their field emission properties. This behaviour was demonstrated to be mainly related to changes in the surface roughness of the samples, in connection with the development of graphite-like structures.",
keywords = "Carbon, Field emission, Nitrogen, Pulsed laser deposition, Surface roughness",
author = "E. Fogarassy and T. Sz{\"o}r{\'e}nyi and F. Antoni and Stoquert, {J. P.} and G. Pirio and J. Olivier and P. Legagneux and P. Boher and O. Pons-Y-Moll",
year = "2002",
doi = "10.1016/S0169-4332(02)00389-6",
language = "English",
volume = "197-198",
pages = "316--320",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

TY - JOUR

T1 - Influence of the nitrogen content on the field emission properties of a-CNx films prepared by pulsed laser deposition

AU - Fogarassy, E.

AU - Szörényi, T.

AU - Antoni, F.

AU - Stoquert, J. P.

AU - Pirio, G.

AU - Olivier, J.

AU - Legagneux, P.

AU - Boher, P.

AU - Pons-Y-Moll, O.

PY - 2002

Y1 - 2002

N2 - Amorphous carbon nitride (a-CNx) films were grown on silicon substrates by ArF excimer laser ablation of a graphite target in the presence of nitrogen at various gas pressures. By working at elevated pressures (up to 100 Pa), high amounts of nitrogen can be incorporated into the films (N/C ≤ 0.4) which lead to strong enhancement of their field emission properties. This behaviour was demonstrated to be mainly related to changes in the surface roughness of the samples, in connection with the development of graphite-like structures.

AB - Amorphous carbon nitride (a-CNx) films were grown on silicon substrates by ArF excimer laser ablation of a graphite target in the presence of nitrogen at various gas pressures. By working at elevated pressures (up to 100 Pa), high amounts of nitrogen can be incorporated into the films (N/C ≤ 0.4) which lead to strong enhancement of their field emission properties. This behaviour was demonstrated to be mainly related to changes in the surface roughness of the samples, in connection with the development of graphite-like structures.

KW - Carbon

KW - Field emission

KW - Nitrogen

KW - Pulsed laser deposition

KW - Surface roughness

UR - http://www.scopus.com/inward/record.url?scp=0036419988&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036419988&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(02)00389-6

DO - 10.1016/S0169-4332(02)00389-6

M3 - Article

AN - SCOPUS:0036419988

VL - 197-198

SP - 316

EP - 320

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -