Influence of the biased electrode on the plasma potential in ECRIS

V. Mironov, K. E. Stiebing, O. Hohn, L. Schmidt, H. Schmidt-Böcking, S. Runkel, A. Schempp, G. Shirkov, S. Biri, L. Kenéz

Research output: Contribution to journalArticle

11 Citations (Scopus)
Original languageEnglish
Pages (from-to)623
Number of pages1
JournalReview of Scientific Instruments
Volume73
Issue number2 II
DOIs
Publication statusPublished - Feb 2002

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plasma potentials
Plasmas
Electrodes
electrodes

ASJC Scopus subject areas

  • Instrumentation
  • Physics and Astronomy (miscellaneous)

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Mironov, V., Stiebing, K. E., Hohn, O., Schmidt, L., Schmidt-Böcking, H., Runkel, S., ... Kenéz, L. (2002). Influence of the biased electrode on the plasma potential in ECRIS. Review of Scientific Instruments, 73(2 II), 623. https://doi.org/10.1063/1.1431700

Influence of the biased electrode on the plasma potential in ECRIS. / Mironov, V.; Stiebing, K. E.; Hohn, O.; Schmidt, L.; Schmidt-Böcking, H.; Runkel, S.; Schempp, A.; Shirkov, G.; Biri, S.; Kenéz, L.

In: Review of Scientific Instruments, Vol. 73, No. 2 II, 02.2002, p. 623.

Research output: Contribution to journalArticle

Mironov, V, Stiebing, KE, Hohn, O, Schmidt, L, Schmidt-Böcking, H, Runkel, S, Schempp, A, Shirkov, G, Biri, S & Kenéz, L 2002, 'Influence of the biased electrode on the plasma potential in ECRIS', Review of Scientific Instruments, vol. 73, no. 2 II, pp. 623. https://doi.org/10.1063/1.1431700
Mironov V, Stiebing KE, Hohn O, Schmidt L, Schmidt-Böcking H, Runkel S et al. Influence of the biased electrode on the plasma potential in ECRIS. Review of Scientific Instruments. 2002 Feb;73(2 II):623. https://doi.org/10.1063/1.1431700
Mironov, V. ; Stiebing, K. E. ; Hohn, O. ; Schmidt, L. ; Schmidt-Böcking, H. ; Runkel, S. ; Schempp, A. ; Shirkov, G. ; Biri, S. ; Kenéz, L. / Influence of the biased electrode on the plasma potential in ECRIS. In: Review of Scientific Instruments. 2002 ; Vol. 73, No. 2 II. pp. 623.
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