Influence of the biased electrode on the plasma potential in ECRIS

V. Mironov, K. E. Stiebing, O. Hohn, L. Schmidt, H. Schmidt-Böcking, S. Runkel, A. Schempp, G. Shirkov, S. Biri, L. Kenéz

Research output: Contribution to journalConference article

11 Citations (Scopus)
Original languageEnglish
Number of pages1
JournalReview of Scientific Instruments
Volume73
Issue number2 II
DOIs
Publication statusPublished - Feb 1 2002
EventProceedings of the 9th International Conference on ION Sources - Oakland, CA, United States
Duration: Sep 3 2001Sep 7 2001

ASJC Scopus subject areas

  • Instrumentation

Cite this

Mironov, V., Stiebing, K. E., Hohn, O., Schmidt, L., Schmidt-Böcking, H., Runkel, S., Schempp, A., Shirkov, G., Biri, S., & Kenéz, L. (2002). Influence of the biased electrode on the plasma potential in ECRIS. Review of Scientific Instruments, 73(2 II). https://doi.org/10.1063/1.1431700