Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYNCrN physical vapor deposition coatings

G. Sáfrán, C. Reinhard, A. P. Ehiasarian, P. Barna, L. Sźkely, O. Geszti, P. Eh Hovsepian

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Abstract

The effects of bias voltage on the microstructure and the related tribological properties of CrAlYNCrN nanoscale multilayer superlattice coatings were investigated. The coatings were deposited at 450 °C substrate temperature by combined high power impulse magnetron sputtering (HIPIMS) and unbalanced magnetron sputtering techniques. The substrates were 304 stainless steel, M2 high speed steel for structural analysis and mechanical testing, as well as cemented carbide substrates end mills for dry high speed milling applications. Substrates were pretreated by HIPIMS etching. The bias voltage Ub was varied between -75 and -150 V. The chemical composition was determined by neutral mass spectroscopy. The microstructure was characterized by x-ray diffraction and cross sectional transmission electron microscopy. All coatings had a single phase B1 fcc structure. The chemical composition was not affected by the bias voltage. Local epitaxial or axiotaxial growth attributed to the HIPIMS etching pretreatment was observed on the large surface areas of the substrate crystals. This turned to columnar growth with {110} texture at low bias voltages Ub between -75 and -120 V, while at Ub =-150 V an equiaxed structure of large crystal sizes developed with {111} texture. At the same time the waviness of the superlattice significantly decreased. An increase in bias voltage resulted in a significant rise in both residual stress levels (from -3.3 to -9.5 GPa) and plastic hardness (from Hp =34-51 GPa), while the coating/substrate adhesion decreased from 61 to 45 N. The friction coefficient increased from 0.43 (at Ub =-75 V) to 0.55 (at UB =-120 V), while the initial sliding wear rates decreased remarkably (2.6× 10-16 m3 N-1 m-1 at UB =-75 V to 3.7× 10-17 m3 N-1 m-1 at Ub =-150 V). The life time of 8 mm ball-nosed cemented carbide end mills decreased from 39 min at Ub =-75 V to 19 min when Ub was raised to -150 V. These results highlight that the combination of HIPIMS substrate treatment and designed deposition parameters provides good opportunity to tailor coating structures with optimized properties.

Original languageEnglish
Pages (from-to)174-182
Number of pages9
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume27
Issue number2
DOIs
Publication statusPublished - 2009

Fingerprint

Physical vapor deposition
Bias voltage
Multilayers
vapor deposition
Magnetron sputtering
coatings
Coatings
magnetron sputtering
electric potential
Substrates
impulses
carbides
Carbides
Etching
chemical composition
textures
Textures
high speed
etching
Crystals

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{eac833c175d946d5811cb2ea7db24034,
title = "Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYNCrN physical vapor deposition coatings",
abstract = "The effects of bias voltage on the microstructure and the related tribological properties of CrAlYNCrN nanoscale multilayer superlattice coatings were investigated. The coatings were deposited at 450 °C substrate temperature by combined high power impulse magnetron sputtering (HIPIMS) and unbalanced magnetron sputtering techniques. The substrates were 304 stainless steel, M2 high speed steel for structural analysis and mechanical testing, as well as cemented carbide substrates end mills for dry high speed milling applications. Substrates were pretreated by HIPIMS etching. The bias voltage Ub was varied between -75 and -150 V. The chemical composition was determined by neutral mass spectroscopy. The microstructure was characterized by x-ray diffraction and cross sectional transmission electron microscopy. All coatings had a single phase B1 fcc structure. The chemical composition was not affected by the bias voltage. Local epitaxial or axiotaxial growth attributed to the HIPIMS etching pretreatment was observed on the large surface areas of the substrate crystals. This turned to columnar growth with {110} texture at low bias voltages Ub between -75 and -120 V, while at Ub =-150 V an equiaxed structure of large crystal sizes developed with {111} texture. At the same time the waviness of the superlattice significantly decreased. An increase in bias voltage resulted in a significant rise in both residual stress levels (from -3.3 to -9.5 GPa) and plastic hardness (from Hp =34-51 GPa), while the coating/substrate adhesion decreased from 61 to 45 N. The friction coefficient increased from 0.43 (at Ub =-75 V) to 0.55 (at UB =-120 V), while the initial sliding wear rates decreased remarkably (2.6× 10-16 m3 N-1 m-1 at UB =-75 V to 3.7× 10-17 m3 N-1 m-1 at Ub =-150 V). The life time of 8 mm ball-nosed cemented carbide end mills decreased from 39 min at Ub =-75 V to 19 min when Ub was raised to -150 V. These results highlight that the combination of HIPIMS substrate treatment and designed deposition parameters provides good opportunity to tailor coating structures with optimized properties.",
author = "G. S{\'a}fr{\'a}n and C. Reinhard and Ehiasarian, {A. P.} and P. Barna and L. Sźkely and O. Geszti and Hovsepian, {P. Eh}",
year = "2009",
doi = "10.1116/1.3065675",
language = "English",
volume = "27",
pages = "174--182",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "2",

}

TY - JOUR

T1 - Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYNCrN physical vapor deposition coatings

AU - Sáfrán, G.

AU - Reinhard, C.

AU - Ehiasarian, A. P.

AU - Barna, P.

AU - Sźkely, L.

AU - Geszti, O.

AU - Hovsepian, P. Eh

PY - 2009

Y1 - 2009

N2 - The effects of bias voltage on the microstructure and the related tribological properties of CrAlYNCrN nanoscale multilayer superlattice coatings were investigated. The coatings were deposited at 450 °C substrate temperature by combined high power impulse magnetron sputtering (HIPIMS) and unbalanced magnetron sputtering techniques. The substrates were 304 stainless steel, M2 high speed steel for structural analysis and mechanical testing, as well as cemented carbide substrates end mills for dry high speed milling applications. Substrates were pretreated by HIPIMS etching. The bias voltage Ub was varied between -75 and -150 V. The chemical composition was determined by neutral mass spectroscopy. The microstructure was characterized by x-ray diffraction and cross sectional transmission electron microscopy. All coatings had a single phase B1 fcc structure. The chemical composition was not affected by the bias voltage. Local epitaxial or axiotaxial growth attributed to the HIPIMS etching pretreatment was observed on the large surface areas of the substrate crystals. This turned to columnar growth with {110} texture at low bias voltages Ub between -75 and -120 V, while at Ub =-150 V an equiaxed structure of large crystal sizes developed with {111} texture. At the same time the waviness of the superlattice significantly decreased. An increase in bias voltage resulted in a significant rise in both residual stress levels (from -3.3 to -9.5 GPa) and plastic hardness (from Hp =34-51 GPa), while the coating/substrate adhesion decreased from 61 to 45 N. The friction coefficient increased from 0.43 (at Ub =-75 V) to 0.55 (at UB =-120 V), while the initial sliding wear rates decreased remarkably (2.6× 10-16 m3 N-1 m-1 at UB =-75 V to 3.7× 10-17 m3 N-1 m-1 at Ub =-150 V). The life time of 8 mm ball-nosed cemented carbide end mills decreased from 39 min at Ub =-75 V to 19 min when Ub was raised to -150 V. These results highlight that the combination of HIPIMS substrate treatment and designed deposition parameters provides good opportunity to tailor coating structures with optimized properties.

AB - The effects of bias voltage on the microstructure and the related tribological properties of CrAlYNCrN nanoscale multilayer superlattice coatings were investigated. The coatings were deposited at 450 °C substrate temperature by combined high power impulse magnetron sputtering (HIPIMS) and unbalanced magnetron sputtering techniques. The substrates were 304 stainless steel, M2 high speed steel for structural analysis and mechanical testing, as well as cemented carbide substrates end mills for dry high speed milling applications. Substrates were pretreated by HIPIMS etching. The bias voltage Ub was varied between -75 and -150 V. The chemical composition was determined by neutral mass spectroscopy. The microstructure was characterized by x-ray diffraction and cross sectional transmission electron microscopy. All coatings had a single phase B1 fcc structure. The chemical composition was not affected by the bias voltage. Local epitaxial or axiotaxial growth attributed to the HIPIMS etching pretreatment was observed on the large surface areas of the substrate crystals. This turned to columnar growth with {110} texture at low bias voltages Ub between -75 and -120 V, while at Ub =-150 V an equiaxed structure of large crystal sizes developed with {111} texture. At the same time the waviness of the superlattice significantly decreased. An increase in bias voltage resulted in a significant rise in both residual stress levels (from -3.3 to -9.5 GPa) and plastic hardness (from Hp =34-51 GPa), while the coating/substrate adhesion decreased from 61 to 45 N. The friction coefficient increased from 0.43 (at Ub =-75 V) to 0.55 (at UB =-120 V), while the initial sliding wear rates decreased remarkably (2.6× 10-16 m3 N-1 m-1 at UB =-75 V to 3.7× 10-17 m3 N-1 m-1 at Ub =-150 V). The life time of 8 mm ball-nosed cemented carbide end mills decreased from 39 min at Ub =-75 V to 19 min when Ub was raised to -150 V. These results highlight that the combination of HIPIMS substrate treatment and designed deposition parameters provides good opportunity to tailor coating structures with optimized properties.

UR - http://www.scopus.com/inward/record.url?scp=61449184591&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=61449184591&partnerID=8YFLogxK

U2 - 10.1116/1.3065675

DO - 10.1116/1.3065675

M3 - Article

AN - SCOPUS:61449184591

VL - 27

SP - 174

EP - 182

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 2

ER -