Influence of nitrogen impurities on the formation of active species in Ar-O2 plasmas

V. Guerra, K. Kutasi, P. A. Sá, M. Lino Da Silva

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A self-consistent kinetic model was developed in order to study the production of active species in Ar-O2 surface-wave microwave plasmas with a relatively small N2 addition. It is shown that the Ar-O 2-N2 mixture produces efficiently the same active species as an Ar-O2 discharge, including oxygen atoms, metastable O 2(a1 g) molecules and the VUV emitting Ar(4s) states. Furthermore, active N-containing species are additionally produced, in particular N atoms and NO ground-state and excited molecules, which makes the ternary mixture very interesting for numerous plasma applications.

Original languageEnglish
Article number24004
JournalEPJ Applied Physics
Volume56
Issue number2
DOIs
Publication statusPublished - Nov 2011

Fingerprint

Nitrogen
Impurities
Plasmas
nitrogen
Plasma applications
impurities
Atoms
Molecules
Surface waves
Ground state
surface waves
molecules
oxygen atoms
Microwaves
Oxygen
microwaves
Kinetics
ground state
kinetics
atoms

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Instrumentation

Cite this

Influence of nitrogen impurities on the formation of active species in Ar-O2 plasmas. / Guerra, V.; Kutasi, K.; Sá, P. A.; Lino Da Silva, M.

In: EPJ Applied Physics, Vol. 56, No. 2, 24004, 11.2011.

Research output: Contribution to journalArticle

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