Influence of Cl- ions on the photoelectrochemical behaviour of the Cu/H3PO4 system

Á Szücs, M. Novák

Research output: Contribution to journalArticle

4 Citations (Scopus)


The influence of chloride was examined in the Cu/H3PO4 system under electropolishing conditions. The system proved to be very sensitive to Cl-, and large photoeffects depending on the concentration were observed both in the photocurrent and the photopotential.

Original languageEnglish
Pages (from-to)247-250
Number of pages4
JournalJournal of Electroanalytical Chemistry
Issue number2
Publication statusPublished - Oct 24 1986

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

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