In situ AFM, XRD and resistivity studies of the agglomeration of sputtered silver nanolayers

J. Mizsei, V. Lantto

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

In situ atomic force microscopy (AFM), X-ray diffraction (XRD) and resistivity studies have been made for RF cathode-sputtered silver nanolayers on different oxide surfaces during heating between room temperature and 400°C. Our earlier AFM and resistivity measurements revealed the agglomeration of layers during heating. The present in situ AFM, XRD and resistivity measurements show a sudden rapid agglomeration of the sputtered ultra-thin silver nanolayers during heating at specific temperatures, which depend on the layer thickness. When the AFM picturing was initiated from a layer surface at a temperature slightly below the specific agglomeration temperature of the layer, the AFM tip excited the surface starting the agglomeration in the area under picturing. This tip-assisted agglomeration phenomenon made it possible to restrict the area of agglomeration and to produce sub-micron structures in the silver nanolayer by AFM.

Original languageEnglish
Pages (from-to)271-278
Number of pages8
JournalJournal of Nanoparticle Research
Volume3
Issue number4
DOIs
Publication statusPublished - 2001

Fingerprint

Agglomeration
Atomic Force Microscopy
Resistivity
Silver
agglomeration
X-ray Diffraction
Atomic force microscopy
silver
atomic force microscopy
X ray diffraction
electrical resistivity
diffraction
Heating
x rays
heating
Temperature
Oxides
temperature
surface layers
Cathodes

Keywords

  • Agglomeration
  • Gas sensor
  • Nanoparticles
  • Silver
  • Ultra-thin layer

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

Cite this

In situ AFM, XRD and resistivity studies of the agglomeration of sputtered silver nanolayers. / Mizsei, J.; Lantto, V.

In: Journal of Nanoparticle Research, Vol. 3, No. 4, 2001, p. 271-278.

Research output: Contribution to journalArticle

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