IMPLANTATION WITH ION PULSES.

I. Krafcsik, L. Kiralyhidi, P. Riedl, J. Gyulai, M. Fried

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A description of a repetitive-mode pulsed ion implanter is given. Discussed are mode of operation and implantation results for different source materials (CsCl, PTFE, and SiO//2).

Original languageEnglish
Pages (from-to)855-858
Number of pages4
JournalPhysica Status Solidi (A) Applied Research
Volume94
Issue number2
Publication statusPublished - Apr 1986

Fingerprint

Polytetrafluoroethylene
Polytetrafluoroethylenes
Ion implantation
implantation
Ions
pulses
ions
cesium chloride

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Krafcsik, I., Kiralyhidi, L., Riedl, P., Gyulai, J., & Fried, M. (1986). IMPLANTATION WITH ION PULSES. Physica Status Solidi (A) Applied Research, 94(2), 855-858.

IMPLANTATION WITH ION PULSES. / Krafcsik, I.; Kiralyhidi, L.; Riedl, P.; Gyulai, J.; Fried, M.

In: Physica Status Solidi (A) Applied Research, Vol. 94, No. 2, 04.1986, p. 855-858.

Research output: Contribution to journalArticle

Krafcsik, I, Kiralyhidi, L, Riedl, P, Gyulai, J & Fried, M 1986, 'IMPLANTATION WITH ION PULSES.', Physica Status Solidi (A) Applied Research, vol. 94, no. 2, pp. 855-858.
Krafcsik I, Kiralyhidi L, Riedl P, Gyulai J, Fried M. IMPLANTATION WITH ION PULSES. Physica Status Solidi (A) Applied Research. 1986 Apr;94(2):855-858.
Krafcsik, I. ; Kiralyhidi, L. ; Riedl, P. ; Gyulai, J. ; Fried, M. / IMPLANTATION WITH ION PULSES. In: Physica Status Solidi (A) Applied Research. 1986 ; Vol. 94, No. 2. pp. 855-858.
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