Implantation with ion pulses

I. Krafcsik, L. Kiralyhidi, P. Riedl, J. Gyulai, M. Fried

Research output: Contribution to journalArticle

1 Citation (Scopus)


A description of a repetitive‐mode pulsed ion implanter is given. Discussed are mode of operation and implantation results for different source materials (CsCl, PTFE, and SiO2).

Original languageEnglish
Pages (from-to)855-858
Number of pages4
Journalphysica status solidi (a)
Issue number2
Publication statusPublished - Apr 16 1986

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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