IMAGING OF THE MICROTOPOGRAPHY OF SILICON (111) SURFACES BY GOLD DECORATION.

D. Katzer, G. Sáfrán

Research output: Contribution to journalArticle

Abstract

A decoration method was developed for studying the microtopography of Si (111) surfaces. The Si (111) single crystal surfaces were cleaned by heat treatment and decorated by gold deposition in an uhv system. A selective reaction of Au and Si occurred preferentially on the surface steps developed by sublimation at the 1220 degree C heat treatment. The gold-silicon alloy formation at the steps took place in a temperature range of 475 plus or minus 20 degree C, producing the 'reaction decoration' pattern. The decorated surface was studied in a STEM using secondary electron imaging. A crystallographic anisotropy was found in the velocity of step propagation during the sublimation.

Original languageEnglish
Pages (from-to)193
Number of pages1
JournalVacuum
Volume37
Issue number1-2
Publication statusPublished - 1985

Fingerprint

Silicon
Gold
Sublimation
gold
sublimation
Imaging techniques
silicon
heat treatment
Heat treatment
Gold alloys
Single crystal surfaces
gold alloys
Silicon alloys
silicon alloys
crystal surfaces
Anisotropy
anisotropy
propagation
Electrons
single crystals

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

IMAGING OF THE MICROTOPOGRAPHY OF SILICON (111) SURFACES BY GOLD DECORATION. / Katzer, D.; Sáfrán, G.

In: Vacuum, Vol. 37, No. 1-2, 1985, p. 193.

Research output: Contribution to journalArticle

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