Highly charged metal ions by placing a ferrocene container inside the ECR ion source

K. E. Stiebing, S. Biri, J. Arje, F. Ditrói, H. Koivisto, J. Pálinkás, L. Schmidt, A. Valek

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)

Abstract

The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of material into the source plasma. In the original method, the material container (MIVOC chamber) is mounted externally. The flow rate of material depends on the conductance of the pipe connecting the container to the plasma chamber and can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material container into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 μA of highly charged Fe and Ni ions have been produced.

Original languageEnglish
Title of host publicationPhysica Scripta T
Pages509-510
Number of pages2
Volume80
EditionB
Publication statusPublished - 1999

Fingerprint

containers
ion sources
metal ions
flow velocity
electron cyclotron resonance
chambers
mounting
dosage
ions

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Stiebing, K. E., Biri, S., Arje, J., Ditrói, F., Koivisto, H., Pálinkás, J., ... Valek, A. (1999). Highly charged metal ions by placing a ferrocene container inside the ECR ion source. In Physica Scripta T (B ed., Vol. 80, pp. 509-510)

Highly charged metal ions by placing a ferrocene container inside the ECR ion source. / Stiebing, K. E.; Biri, S.; Arje, J.; Ditrói, F.; Koivisto, H.; Pálinkás, J.; Schmidt, L.; Valek, A.

Physica Scripta T. Vol. 80 B. ed. 1999. p. 509-510.

Research output: Chapter in Book/Report/Conference proceedingChapter

Stiebing, KE, Biri, S, Arje, J, Ditrói, F, Koivisto, H, Pálinkás, J, Schmidt, L & Valek, A 1999, Highly charged metal ions by placing a ferrocene container inside the ECR ion source. in Physica Scripta T. B edn, vol. 80, pp. 509-510.
Stiebing KE, Biri S, Arje J, Ditrói F, Koivisto H, Pálinkás J et al. Highly charged metal ions by placing a ferrocene container inside the ECR ion source. In Physica Scripta T. B ed. Vol. 80. 1999. p. 509-510
Stiebing, K. E. ; Biri, S. ; Arje, J. ; Ditrói, F. ; Koivisto, H. ; Pálinkás, J. ; Schmidt, L. ; Valek, A. / Highly charged metal ions by placing a ferrocene container inside the ECR ion source. Physica Scripta T. Vol. 80 B. ed. 1999. pp. 509-510
@inbook{011cbd7af5cd48fcb19506f3823dfbbb,
title = "Highly charged metal ions by placing a ferrocene container inside the ECR ion source",
abstract = "The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of material into the source plasma. In the original method, the material container (MIVOC chamber) is mounted externally. The flow rate of material depends on the conductance of the pipe connecting the container to the plasma chamber and can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material container into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 μA of highly charged Fe and Ni ions have been produced.",
author = "Stiebing, {K. E.} and S. Biri and J. Arje and F. Ditr{\'o}i and H. Koivisto and J. P{\'a}link{\'a}s and L. Schmidt and A. Valek",
year = "1999",
language = "English",
volume = "80",
pages = "509--510",
booktitle = "Physica Scripta T",
edition = "B",

}

TY - CHAP

T1 - Highly charged metal ions by placing a ferrocene container inside the ECR ion source

AU - Stiebing, K. E.

AU - Biri, S.

AU - Arje, J.

AU - Ditrói, F.

AU - Koivisto, H.

AU - Pálinkás, J.

AU - Schmidt, L.

AU - Valek, A.

PY - 1999

Y1 - 1999

N2 - The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of material into the source plasma. In the original method, the material container (MIVOC chamber) is mounted externally. The flow rate of material depends on the conductance of the pipe connecting the container to the plasma chamber and can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material container into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 μA of highly charged Fe and Ni ions have been produced.

AB - The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of material into the source plasma. In the original method, the material container (MIVOC chamber) is mounted externally. The flow rate of material depends on the conductance of the pipe connecting the container to the plasma chamber and can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material container into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 μA of highly charged Fe and Ni ions have been produced.

UR - http://www.scopus.com/inward/record.url?scp=0039621285&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0039621285&partnerID=8YFLogxK

M3 - Chapter

AN - SCOPUS:0039621285

VL - 80

SP - 509

EP - 510

BT - Physica Scripta T

ER -