The production of metal ions from volatile compounds (MIVOC) in an electron cyclotron resonance ion source (ECRIS) depends on the flow rate of material into the source plasma. In the original method, the material container (MIVOC chamber) is mounted externally. The flow rate of material depends on the conductance of the pipe connecting the container to the plasma chamber and can be regulated via a dosing valve. In the ATOMKI-ECRIS the conductance is not high enough to apply external mounting. By placing the material container into the ECR ion source itself and by applying a special technique to dose the flow rate of material, beams of more than 10 μA of highly charged Fe and Ni ions have been produced.
|Number of pages||2|
|Journal||Physica Scripta T|
|Publication status||Published - Dec 1 1999|
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Mathematical Physics
- Condensed Matter Physics