High-yield fabrication of nm-size gaps in monolayer CVD graphene

Cornelia Nef, László Pósa, Péter Makk, Wangyang Fu, András Halbritter, Christian Schönenberger, Michel Calame

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45 Citations (Scopus)


Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.

Original languageEnglish
Pages (from-to)7249-7254
Number of pages6
Issue number13
Publication statusPublished - Jul 7 2014


ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Nef, C., Pósa, L., Makk, P., Fu, W., Halbritter, A., Schönenberger, C., & Calame, M. (2014). High-yield fabrication of nm-size gaps in monolayer CVD graphene. Nanoscale, 6(13), 7249-7254. https://doi.org/10.1039/c4nr01838a