High strength of ultrafine-grained Al-Mg films and the relevance of the modified Hall-Petch-type relationship

Research output: Contribution to journalArticle

Abstract

Composition-dependent microstructure and mechanical properties of ultrafine-grained Al and Al-Mg films fabricated by DC magnetron sputtering with the novel micro-combinatorial technique were studied by transmission electron microscopy, atomic force microscopy, and nanoindentation. It was revealed that these films have extremely high strength, enabling their potential application as protecting layers. Besides the possible practical applications, the results of the present work also confirm the validity of the modified Hall-Petch relationship for the uniform description of the strength of face-centered cubic metals and solid solution having ultrafine-grain size.

Original languageEnglish
JournalMRS Communications
DOIs
Publication statusAccepted/In press - Jan 1 2019

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Nanoindentation
Magnetron sputtering
Solid solutions
Atomic force microscopy
Metals
Transmission electron microscopy
Mechanical properties
Microstructure
Chemical analysis
Ultrafine

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

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abstract = "Composition-dependent microstructure and mechanical properties of ultrafine-grained Al and Al-Mg films fabricated by DC magnetron sputtering with the novel micro-combinatorial technique were studied by transmission electron microscopy, atomic force microscopy, and nanoindentation. It was revealed that these films have extremely high strength, enabling their potential application as protecting layers. Besides the possible practical applications, the results of the present work also confirm the validity of the modified Hall-Petch relationship for the uniform description of the strength of face-centered cubic metals and solid solution having ultrafine-grain size.",
author = "N. Chinh and G. S{\'a}fr{\'a}n",
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AB - Composition-dependent microstructure and mechanical properties of ultrafine-grained Al and Al-Mg films fabricated by DC magnetron sputtering with the novel micro-combinatorial technique were studied by transmission electron microscopy, atomic force microscopy, and nanoindentation. It was revealed that these films have extremely high strength, enabling their potential application as protecting layers. Besides the possible practical applications, the results of the present work also confirm the validity of the modified Hall-Petch relationship for the uniform description of the strength of face-centered cubic metals and solid solution having ultrafine-grain size.

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