High lateral resolution 2D mapping of the B/C ratio in a boron carbide film formed by femtosecond pulsed laser deposition

A. Simon, T. Csákó, C. Jeynes, T. Szörényi

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Boron carbide films with a thickness of up to 550 nm and deposit size of 40 mm × 30 mm were prepared by ablating a B4C target in high vacuum by pulses of 700 fs duration at 248 nm. Layer thickness and lateral distribution of the constituting elements along the symmetry axes of a deposit were investigated with Rutherford backscattering spectrometry (RBS) with a focussed 2.5 MeV He+ ion beam. RBS spectra were fitted with the DataFurnace computer code. The results of 2D mapping proved that both the elemental composition and the film thickness of the deposit were non-uniform. The B/C ∼ 1 ratio measured at the edge of the deposit increased up to about three toward the centre, with both the B content and the B/C ratio varying linearly with the film thickness.

Original languageEnglish
Pages (from-to)454-457
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume249
Issue number1-2 SPEC. ISS.
DOIs
Publication statusPublished - Aug 2006

Fingerprint

Boron carbide
boron carbides
Pulsed laser deposition
pulsed laser deposition
Deposits
deposits
Rutherford backscattering spectroscopy
Spectrometry
Film thickness
backscattering
film thickness
high vacuum
Ion beams
spectroscopy
ion beams
Vacuum
computer programs
symmetry
pulses
Chemical analysis

Keywords

  • Boron carbide
  • Chemical composition
  • Microbeam
  • Pulsed laser deposition
  • Rutherford backscattering spectrometry
  • Thickness profile

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

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title = "High lateral resolution 2D mapping of the B/C ratio in a boron carbide film formed by femtosecond pulsed laser deposition",
abstract = "Boron carbide films with a thickness of up to 550 nm and deposit size of 40 mm × 30 mm were prepared by ablating a B4C target in high vacuum by pulses of 700 fs duration at 248 nm. Layer thickness and lateral distribution of the constituting elements along the symmetry axes of a deposit were investigated with Rutherford backscattering spectrometry (RBS) with a focussed 2.5 MeV He+ ion beam. RBS spectra were fitted with the DataFurnace computer code. The results of 2D mapping proved that both the elemental composition and the film thickness of the deposit were non-uniform. The B/C ∼ 1 ratio measured at the edge of the deposit increased up to about three toward the centre, with both the B content and the B/C ratio varying linearly with the film thickness.",
keywords = "Boron carbide, Chemical composition, Microbeam, Pulsed laser deposition, Rutherford backscattering spectrometry, Thickness profile",
author = "A. Simon and T. Cs{\'a}k{\'o} and C. Jeynes and T. Sz{\"o}r{\'e}nyi",
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TY - JOUR

T1 - High lateral resolution 2D mapping of the B/C ratio in a boron carbide film formed by femtosecond pulsed laser deposition

AU - Simon, A.

AU - Csákó, T.

AU - Jeynes, C.

AU - Szörényi, T.

PY - 2006/8

Y1 - 2006/8

N2 - Boron carbide films with a thickness of up to 550 nm and deposit size of 40 mm × 30 mm were prepared by ablating a B4C target in high vacuum by pulses of 700 fs duration at 248 nm. Layer thickness and lateral distribution of the constituting elements along the symmetry axes of a deposit were investigated with Rutherford backscattering spectrometry (RBS) with a focussed 2.5 MeV He+ ion beam. RBS spectra were fitted with the DataFurnace computer code. The results of 2D mapping proved that both the elemental composition and the film thickness of the deposit were non-uniform. The B/C ∼ 1 ratio measured at the edge of the deposit increased up to about three toward the centre, with both the B content and the B/C ratio varying linearly with the film thickness.

AB - Boron carbide films with a thickness of up to 550 nm and deposit size of 40 mm × 30 mm were prepared by ablating a B4C target in high vacuum by pulses of 700 fs duration at 248 nm. Layer thickness and lateral distribution of the constituting elements along the symmetry axes of a deposit were investigated with Rutherford backscattering spectrometry (RBS) with a focussed 2.5 MeV He+ ion beam. RBS spectra were fitted with the DataFurnace computer code. The results of 2D mapping proved that both the elemental composition and the film thickness of the deposit were non-uniform. The B/C ∼ 1 ratio measured at the edge of the deposit increased up to about three toward the centre, with both the B content and the B/C ratio varying linearly with the film thickness.

KW - Boron carbide

KW - Chemical composition

KW - Microbeam

KW - Pulsed laser deposition

KW - Rutherford backscattering spectrometry

KW - Thickness profile

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