Growth structure and properties of Fe rich Fe-Ni alloy films deposited on MgO(001) by d.c.-biased plasma-sputtering

Jiping Yang, Arpad Barna, Kenji Makihara, Mituru Hashimoto, Peter B. Barna

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Ni-Fe alloy films of about 100 nm in thickness were deposited on MgO(001) substrates at 250°C by d.c. plasma sputtering at 2.5 kV in pure Ar gas by applying a Ni0.3Fe0.7(Invar) or Ni0.2Fe0.8 target. A d.c. bias voltage Vs between 0 and -180 V was applied to the substrate during deposition. The structure and composition of the films were investigated by X-ray photoelectron spectroscopy (XPS), and by cross sectional transmission electron microscopy (XTEM). The resistance, its temperature coefficient TCR (150 to 300K) and saturation magnetization 4πMs at 300 K were measured as a function of Vs. With the use of Ni0.3Fe0.7 target, Ni1-xFex films with x between 0.68 ± 0.03 and 0.73 ± 0.03, can be prepared where x was weakly dependent on Vs. The film is epitaxially grown mainly with FCC-NiFe(001)[010] ∥ MgO(001)[010] accompanied with the initial thin layer of about 5 to 10 nm in thickness with BCC-NiFe(001)[110] ∥ MgO(001)[100] at the interface at Vs values studied. Maximum TCR and minimum resistance are observed between Vs = -120 to -160 V. 4πMs takes greater value at Vs ≥ 120 V. In the case of Ni0.2Fe0.8 target at Vs = -120 V, Ni1-xFex films with x = 0.80 ± 0.03 are entirely grown in a BCC structure with NiFe(001)[110] ∥ MgO(001)[100].

Original languageEnglish
Pages (from-to)85-90
Number of pages6
JournalThin Solid Films
Issue number1-2
Publication statusPublished - Jun 22 1999


ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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