Growth structure and properties of Fe rich Fe-Ni alloy films deposited on MgO(001) by d.c.-biased plasma-sputtering

Jiping Yang, A. Barna, Kenji Makihara, Mituru Hashimoto, P. Barna

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Ni-Fe alloy films of about 100 nm in thickness were deposited on MgO(001) substrates at 250°C by d.c. plasma sputtering at 2.5 kV in pure Ar gas by applying a Ni0.3Fe0.7(Invar) or Ni0.2Fe0.8 target. A d.c. bias voltage Vs between 0 and -180 V was applied to the substrate during deposition. The structure and composition of the films were investigated by X-ray photoelectron spectroscopy (XPS), and by cross sectional transmission electron microscopy (XTEM). The resistance, its temperature coefficient TCR (150 to 300K) and saturation magnetization 4πMs at 300 K were measured as a function of Vs. With the use of Ni0.3Fe0.7 target, Ni1-xFex films with x between 0.68 ± 0.03 and 0.73 ± 0.03, can be prepared where x was weakly dependent on Vs. The film is epitaxially grown mainly with FCC-NiFe(001)[010] ∥ MgO(001)[010] accompanied with the initial thin layer of about 5 to 10 nm in thickness with BCC-NiFe(001)[110] ∥ MgO(001)[100] at the interface at Vs values studied. Maximum TCR and minimum resistance are observed between Vs = -120 to -160 V. 4πMs takes greater value at Vs ≥ 120 V. In the case of Ni0.2Fe0.8 target at Vs = -120 V, Ni1-xFex films with x = 0.80 ± 0.03 are entirely grown in a BCC structure with NiFe(001)[110] ∥ MgO(001)[100].

Original languageEnglish
Pages (from-to)85-90
Number of pages6
JournalThin Solid Films
Volume347
Issue number1-2
DOIs
Publication statusPublished - Jun 22 1999

Fingerprint

Sputtering
sputtering
Plasmas
Substrates
Saturation magnetization
Bias voltage
X ray photoelectron spectroscopy
Gases
photoelectron spectroscopy
Transmission electron microscopy
saturation
magnetization
transmission electron microscopy
electric potential
coefficients
Chemical analysis
gases
x rays
Temperature
temperature

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Growth structure and properties of Fe rich Fe-Ni alloy films deposited on MgO(001) by d.c.-biased plasma-sputtering. / Yang, Jiping; Barna, A.; Makihara, Kenji; Hashimoto, Mituru; Barna, P.

In: Thin Solid Films, Vol. 347, No. 1-2, 22.06.1999, p. 85-90.

Research output: Contribution to journalArticle

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