Growth processes in amorphous metallic films

A computer simulation

R. Manaila, A. Devenyi, P. Barna, G. Radnóczi

Research output: Contribution to journalArticle

Abstract

A polytetrahedral, three-dimensional computer model was developed under a variety of physical assumptions in order to simulate an amorphous metallic film in its initial (granulated) growth stage. it was shown that the growth conditions imposed and the diffusion length of the adatoms influence the shape of the cluster. Topological parameters (degree of local tetrahedral perfection, average coordination number, atomic pair distribution) were also derived. The frustrated character of the structure is suggested by the energy-per-adatom evolution during growth. In model alloy clusters, the built-in degree of frustration could be varied, leading to different degrees of chemical short-range order.

Original languageEnglish
Pages (from-to)299-312
Number of pages14
JournalThin Solid Films
Volume158
Issue number2
DOIs
Publication statusPublished - 1988

Fingerprint

Metallic films
Amorphous films
Adatoms
computerized simulation
adatoms
Computer simulation
frustration
diffusion length
coordination number
energy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Growth processes in amorphous metallic films : A computer simulation. / Manaila, R.; Devenyi, A.; Barna, P.; Radnóczi, G.

In: Thin Solid Films, Vol. 158, No. 2, 1988, p. 299-312.

Research output: Contribution to journalArticle

@article{6fef3755fe6d475a90a4f90f0b4cc04a,
title = "Growth processes in amorphous metallic films: A computer simulation",
abstract = "A polytetrahedral, three-dimensional computer model was developed under a variety of physical assumptions in order to simulate an amorphous metallic film in its initial (granulated) growth stage. it was shown that the growth conditions imposed and the diffusion length of the adatoms influence the shape of the cluster. Topological parameters (degree of local tetrahedral perfection, average coordination number, atomic pair distribution) were also derived. The frustrated character of the structure is suggested by the energy-per-adatom evolution during growth. In model alloy clusters, the built-in degree of frustration could be varied, leading to different degrees of chemical short-range order.",
author = "R. Manaila and A. Devenyi and P. Barna and G. Radn{\'o}czi",
year = "1988",
doi = "10.1016/0040-6090(88)90033-8",
language = "English",
volume = "158",
pages = "299--312",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "2",

}

TY - JOUR

T1 - Growth processes in amorphous metallic films

T2 - A computer simulation

AU - Manaila, R.

AU - Devenyi, A.

AU - Barna, P.

AU - Radnóczi, G.

PY - 1988

Y1 - 1988

N2 - A polytetrahedral, three-dimensional computer model was developed under a variety of physical assumptions in order to simulate an amorphous metallic film in its initial (granulated) growth stage. it was shown that the growth conditions imposed and the diffusion length of the adatoms influence the shape of the cluster. Topological parameters (degree of local tetrahedral perfection, average coordination number, atomic pair distribution) were also derived. The frustrated character of the structure is suggested by the energy-per-adatom evolution during growth. In model alloy clusters, the built-in degree of frustration could be varied, leading to different degrees of chemical short-range order.

AB - A polytetrahedral, three-dimensional computer model was developed under a variety of physical assumptions in order to simulate an amorphous metallic film in its initial (granulated) growth stage. it was shown that the growth conditions imposed and the diffusion length of the adatoms influence the shape of the cluster. Topological parameters (degree of local tetrahedral perfection, average coordination number, atomic pair distribution) were also derived. The frustrated character of the structure is suggested by the energy-per-adatom evolution during growth. In model alloy clusters, the built-in degree of frustration could be varied, leading to different degrees of chemical short-range order.

UR - http://www.scopus.com/inward/record.url?scp=0023994451&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0023994451&partnerID=8YFLogxK

U2 - 10.1016/0040-6090(88)90033-8

DO - 10.1016/0040-6090(88)90033-8

M3 - Article

VL - 158

SP - 299

EP - 312

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 2

ER -