Growth processes in amorphous metallic films: A computer simulation

R. Manaila, A. Devenyi, P. B. Barna, G. Radnoczi

Research output: Contribution to journalArticle

Abstract

A polytetrahedral, three-dimensional computer model was developed under a variety of physical assumptions in order to simulate an amorphous metallic film in its initial (granulated) growth stage. it was shown that the growth conditions imposed and the diffusion length of the adatoms influence the shape of the cluster. Topological parameters (degree of local tetrahedral perfection, average coordination number, atomic pair distribution) were also derived. The frustrated character of the structure is suggested by the energy-per-adatom evolution during growth. In model alloy clusters, the built-in degree of frustration could be varied, leading to different degrees of chemical short-range order.

Original languageEnglish
Pages (from-to)299-312
Number of pages14
JournalThin Solid Films
Volume158
Issue number2
DOIs
Publication statusPublished - Apr 1988

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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