Growth characteristics of tungsten-carbon films deposited by magnetron sputtering

E. Harry, Y. Pauleau, M. Adamik, P. B. Barna, A. Sulyok, M. Menyhárd

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Tungsten and tungsten-carbon films have been deposited by direct and reactive magnetron sputtering in pure Ar and Ar-CH4 mixtures, respectively. The structural properties of W and W-C/substrate samples were investigated by cross-sectional transmission electron microscopy, concentrating on the structure of the interface regions. Both pure tungsten and tungsten-carbon films exhibit a regular columnar structure, but in the case of carbon-doped films, growth begins by the formation of a nanocrystalline α-W structure. At a certain film thickness, depending on the amount of the incorporated carbon, the growth of the films changes to the formation of a polycrystalline columnar structure. The carbon content is higher in the nanocrystalline part of the film, which is always present independently of the applied substrate material.

Original languageEnglish
Pages (from-to)291-294
Number of pages4
JournalSurface and Coatings Technology
Volume100-101
Issue number1-3
DOIs
Publication statusPublished - Mar 1998

Keywords

  • Growth characteristics
  • Magnetron sputtering
  • Tungsten-carbon

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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