FTIR study of the interaction of ethyl iodide with different oxides and Rh/SiO2 catalysts

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Abstract

The adsorption and surface reactions of C2H5I on SiO2, Al2O3, MgO, TiO2, and Rh/SiO2 were monitored with Fourier transform infrared spectroscopy. Molecular adsorption was found on all the oxides examined at 206 K. Only reversible adsorption was observed on SiO2, while on the other oxides an ethoxide group was detected from ∼263 K. Surface OH groups and possibly Lewis acidic and/or basic centers are involved in the process. In the case of alumina, one part of C2H5O(a) was formed on a special configuration of active sites (ensemble effect). Spectroscopic identification of C2H5O(a) was confirmed by ethanol adsorption. Ethoxide formation was rather limited on MgO probably due to the lack of strong Lewis acid sites. Dissociative adsorption of C2H5I occurred on Rh/SiO2 at 206 K. Ethylidyne (CCH3(a)) was formed, very probably through an ethyl intermediate. CCH3(a) was stable up to 373 K. In addition, the formation of ethoxide species bonded to the SiO2 support was observed, which was explained with a spillover process of ethyl species from the Rh onto silica.

Original languageEnglish
Pages (from-to)8829-8835
Number of pages7
JournalLangmuir
Volume18
Issue number23
DOIs
Publication statusPublished - Nov 12 2002

Fingerprint

Iodides
Oxides
iodides
Adsorption
catalysts
Catalysts
adsorption
oxides
interactions
Lewis Acids
Aluminum Oxide
Surface reactions
Silicon Dioxide
surface reactions
Fourier transform infrared spectroscopy
Ethanol
ethyl alcohol
Alumina
aluminum oxides
infrared spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

FTIR study of the interaction of ethyl iodide with different oxides and Rh/SiO2 catalysts. / Óvári, L.; Solymosi, F.

In: Langmuir, Vol. 18, No. 23, 12.11.2002, p. 8829-8835.

Research output: Contribution to journalArticle

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abstract = "The adsorption and surface reactions of C2H5I on SiO2, Al2O3, MgO, TiO2, and Rh/SiO2 were monitored with Fourier transform infrared spectroscopy. Molecular adsorption was found on all the oxides examined at 206 K. Only reversible adsorption was observed on SiO2, while on the other oxides an ethoxide group was detected from ∼263 K. Surface OH groups and possibly Lewis acidic and/or basic centers are involved in the process. In the case of alumina, one part of C2H5O(a) was formed on a special configuration of active sites (ensemble effect). Spectroscopic identification of C2H5O(a) was confirmed by ethanol adsorption. Ethoxide formation was rather limited on MgO probably due to the lack of strong Lewis acid sites. Dissociative adsorption of C2H5I occurred on Rh/SiO2 at 206 K. Ethylidyne (CCH3(a)) was formed, very probably through an ethyl intermediate. CCH3(a) was stable up to 373 K. In addition, the formation of ethoxide species bonded to the SiO2 support was observed, which was explained with a spillover process of ethyl species from the Rh onto silica.",
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N2 - The adsorption and surface reactions of C2H5I on SiO2, Al2O3, MgO, TiO2, and Rh/SiO2 were monitored with Fourier transform infrared spectroscopy. Molecular adsorption was found on all the oxides examined at 206 K. Only reversible adsorption was observed on SiO2, while on the other oxides an ethoxide group was detected from ∼263 K. Surface OH groups and possibly Lewis acidic and/or basic centers are involved in the process. In the case of alumina, one part of C2H5O(a) was formed on a special configuration of active sites (ensemble effect). Spectroscopic identification of C2H5O(a) was confirmed by ethanol adsorption. Ethoxide formation was rather limited on MgO probably due to the lack of strong Lewis acid sites. Dissociative adsorption of C2H5I occurred on Rh/SiO2 at 206 K. Ethylidyne (CCH3(a)) was formed, very probably through an ethyl intermediate. CCH3(a) was stable up to 373 K. In addition, the formation of ethoxide species bonded to the SiO2 support was observed, which was explained with a spillover process of ethyl species from the Rh onto silica.

AB - The adsorption and surface reactions of C2H5I on SiO2, Al2O3, MgO, TiO2, and Rh/SiO2 were monitored with Fourier transform infrared spectroscopy. Molecular adsorption was found on all the oxides examined at 206 K. Only reversible adsorption was observed on SiO2, while on the other oxides an ethoxide group was detected from ∼263 K. Surface OH groups and possibly Lewis acidic and/or basic centers are involved in the process. In the case of alumina, one part of C2H5O(a) was formed on a special configuration of active sites (ensemble effect). Spectroscopic identification of C2H5O(a) was confirmed by ethanol adsorption. Ethoxide formation was rather limited on MgO probably due to the lack of strong Lewis acid sites. Dissociative adsorption of C2H5I occurred on Rh/SiO2 at 206 K. Ethylidyne (CCH3(a)) was formed, very probably through an ethyl intermediate. CCH3(a) was stable up to 373 K. In addition, the formation of ethoxide species bonded to the SiO2 support was observed, which was explained with a spillover process of ethyl species from the Rh onto silica.

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