Fractal models for the autocatalytic growth of amorphous thin films

Xiao Dan Pan, A. Szász, Derek J. Fabian

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Fractal models are proposed for the autocatalytic growth of amorphous thin films. The models give good agreement with the growth kinetics measured for electroless deposited films of amorphous nickel-phosphorus. A universal result obtained from the models is discussed, and only self-similarity is found to be important; randomness is effectively eliminated in the model.

Original languageEnglish
Pages (from-to)146-151
Number of pages6
JournalJournal of Applied Physics
Volume66
Issue number1
DOIs
Publication statusPublished - 1989

Fingerprint

fractals
thin films
phosphorus
nickel
kinetics

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Fractal models for the autocatalytic growth of amorphous thin films. / Pan, Xiao Dan; Szász, A.; Fabian, Derek J.

In: Journal of Applied Physics, Vol. 66, No. 1, 1989, p. 146-151.

Research output: Contribution to journalArticle

Pan, Xiao Dan ; Szász, A. ; Fabian, Derek J. / Fractal models for the autocatalytic growth of amorphous thin films. In: Journal of Applied Physics. 1989 ; Vol. 66, No. 1. pp. 146-151.
@article{7d96e44e60c84230a3c45f00d1a82cc2,
title = "Fractal models for the autocatalytic growth of amorphous thin films",
abstract = "Fractal models are proposed for the autocatalytic growth of amorphous thin films. The models give good agreement with the growth kinetics measured for electroless deposited films of amorphous nickel-phosphorus. A universal result obtained from the models is discussed, and only self-similarity is found to be important; randomness is effectively eliminated in the model.",
author = "Pan, {Xiao Dan} and A. Sz{\'a}sz and Fabian, {Derek J.}",
year = "1989",
doi = "10.1063/1.343894",
language = "English",
volume = "66",
pages = "146--151",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "1",

}

TY - JOUR

T1 - Fractal models for the autocatalytic growth of amorphous thin films

AU - Pan, Xiao Dan

AU - Szász, A.

AU - Fabian, Derek J.

PY - 1989

Y1 - 1989

N2 - Fractal models are proposed for the autocatalytic growth of amorphous thin films. The models give good agreement with the growth kinetics measured for electroless deposited films of amorphous nickel-phosphorus. A universal result obtained from the models is discussed, and only self-similarity is found to be important; randomness is effectively eliminated in the model.

AB - Fractal models are proposed for the autocatalytic growth of amorphous thin films. The models give good agreement with the growth kinetics measured for electroless deposited films of amorphous nickel-phosphorus. A universal result obtained from the models is discussed, and only self-similarity is found to be important; randomness is effectively eliminated in the model.

UR - http://www.scopus.com/inward/record.url?scp=3042892732&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3042892732&partnerID=8YFLogxK

U2 - 10.1063/1.343894

DO - 10.1063/1.343894

M3 - Article

AN - SCOPUS:3042892732

VL - 66

SP - 146

EP - 151

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 1

ER -