Formation of nanocrystalline structure of TaSi2 films on silicon

S. I. Sidorenko, Yu N. Makogon, D. Beke, A. Csík, S. N. Dub, E. P. Pavlova, O. V. Zelenin

Research output: Contribution to journalArticle

Abstract

The nanocrystalline structure and mechanical properties of TaSi2 films deposited by sputtering of TaSi2 target have been investigated. The purpose of the work is to research the formation of nanocrystalline structure in TaSi2 films on a silicon substrate. Contamination of the film by O and C atoms during a low-rate deposition causes the formation of an amorphous phase in deposited films. Upon annealing, the amorphous structures crystallize into mixtures of disilicide and a small amount of polysilicide. The formation of nanocrystalline structure changes drastically the mechanical properties of the film. The annealed thin film became nonuniform in thickness. The nanohardness and elastic modulus increase.

Original languageEnglish
Pages (from-to)16-21
Number of pages6
JournalPoroshkovaya Metallurgiya
Issue number1-2
Publication statusPublished - 2003

Fingerprint

Silicon
Nanohardness
Mechanical properties
Deposition rates
Sputtering
Contamination
Elastic moduli
Annealing
Thin films
Atoms
Substrates

Keywords

  • Amorphous phase
  • Crystallization
  • Hardness
  • Nanocrystalline structure
  • Silicide film

ASJC Scopus subject areas

  • Mechanical Engineering
  • Metals and Alloys

Cite this

Sidorenko, S. I., Makogon, Y. N., Beke, D., Csík, A., Dub, S. N., Pavlova, E. P., & Zelenin, O. V. (2003). Formation of nanocrystalline structure of TaSi2 films on silicon. Poroshkovaya Metallurgiya, (1-2), 16-21.

Formation of nanocrystalline structure of TaSi2 films on silicon. / Sidorenko, S. I.; Makogon, Yu N.; Beke, D.; Csík, A.; Dub, S. N.; Pavlova, E. P.; Zelenin, O. V.

In: Poroshkovaya Metallurgiya, No. 1-2, 2003, p. 16-21.

Research output: Contribution to journalArticle

Sidorenko, SI, Makogon, YN, Beke, D, Csík, A, Dub, SN, Pavlova, EP & Zelenin, OV 2003, 'Formation of nanocrystalline structure of TaSi2 films on silicon', Poroshkovaya Metallurgiya, no. 1-2, pp. 16-21.
Sidorenko SI, Makogon YN, Beke D, Csík A, Dub SN, Pavlova EP et al. Formation of nanocrystalline structure of TaSi2 films on silicon. Poroshkovaya Metallurgiya. 2003;(1-2):16-21.
Sidorenko, S. I. ; Makogon, Yu N. ; Beke, D. ; Csík, A. ; Dub, S. N. ; Pavlova, E. P. ; Zelenin, O. V. / Formation of nanocrystalline structure of TaSi2 films on silicon. In: Poroshkovaya Metallurgiya. 2003 ; No. 1-2. pp. 16-21.
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