Formation of Ge nanocrystals in SiO 2 by electron beam evaporation

P. Basa, G. Molnár, L. Dobos, B. Pécz, L. Tóth, A. Tóth, A. A. Koós, L. Dózsa, Á Nemcsics, Z. Horváth

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Ge nanocrystals were formed by electron beam evaporation on SiO 2 covered Si substrates. The size and distribution of the nanocrystals were studied by atomic force microscopy, scanning electron microscopy and cross-sectional transmission electron microscopy. Dependencies of the nanocrystal size, of the nanocrystal surface coverage, and sheet resistance obtained by van der Pauw method of the Ge layer have been found on the evaporation time. The suggested growth mechanism for the formation of nanocrystals is the Volmer-Weber type. The sheet resistance exhibited a power dependence on the nanocrystal size.

Original languageEnglish
Pages (from-to)818-822
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume8
Issue number2
DOIs
Publication statusPublished - Feb 2008

Fingerprint

Nanoparticles
Nanocrystals
Electron beams
Evaporation
Electrons
Sheet resistance
Surface resistance
Atomic Force Microscopy
Transmission Electron Microscopy
Electron Scanning Microscopy
Atomic force microscopy
Transmission electron microscopy
Scanning electron microscopy
Substrates
Growth

Keywords

  • Ge nanocrystals
  • Sheet resistance
  • Size distribution
  • Surface coverage
  • Thermal evaporation

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Materials Science (miscellaneous)
  • Engineering (miscellaneous)

Cite this

Formation of Ge nanocrystals in SiO 2 by electron beam evaporation. / Basa, P.; Molnár, G.; Dobos, L.; Pécz, B.; Tóth, L.; Tóth, A.; Koós, A. A.; Dózsa, L.; Nemcsics, Á; Horváth, Z.

In: Journal of Nanoscience and Nanotechnology, Vol. 8, No. 2, 02.2008, p. 818-822.

Research output: Contribution to journalArticle

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AU - Basa, P.

AU - Molnár, G.

AU - Dobos, L.

AU - Pécz, B.

AU - Tóth, L.

AU - Tóth, A.

AU - Koós, A. A.

AU - Dózsa, L.

AU - Nemcsics, Á

AU - Horváth, Z.

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KW - Sheet resistance

KW - Size distribution

KW - Surface coverage

KW - Thermal evaporation

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