Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films

Mark D. Tucker, Z. Czigány, Esteban Broitman, Lars Hultman, Johanna Rosen

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Carbon and carbon nitride films (CNx, 0 ≤ x ≤ 0.26) were deposited by filtered pulsed cathodic arc and were investigated using transmission electron microscopy and X-ray photoelectron spectroscopy. A "fullerene-like" (FL) structure of ordered graphitic planes, similar to that of magnetron sputtered FL-CNx films, was observed in films deposited at 175 °C and above, with N2 pressures of 0 and 0.5 mTorr. Higher substrate temperatures and significant nitrogen incorporation are required to produce similar FL structure by sputtering, which may, at least in part, be explained by the high ion charge states and ion energies characteristic of arc deposition. A gradual transition from majority sp3-hybridized films to sp2 films was observed with increasing substrate temperature. High elastic recovery, an attractive characteristic mechanical property of FL-CNx films, is evident in arc-deposited films both with and without nitrogen content, and both with and without FL structure.

Original languageEnglish
Article number144312-1
JournalJournal of Applied Physics
Volume115
Issue number14
DOIs
Publication statusPublished - Apr 14 2014

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carbon nitrides
fullerenes
arcs
carbon
nitrogen
ion charge
sputtering
recovery
photoelectron spectroscopy
mechanical properties
transmission electron microscopy
temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films. / Tucker, Mark D.; Czigány, Z.; Broitman, Esteban; Hultman, Lars; Rosen, Johanna.

In: Journal of Applied Physics, Vol. 115, No. 14, 144312-1, 14.04.2014.

Research output: Contribution to journalArticle

Tucker, Mark D. ; Czigány, Z. ; Broitman, Esteban ; Hultman, Lars ; Rosen, Johanna. / Filtered pulsed cathodic arc deposition of fullerene-like carbon and carbon nitride films. In: Journal of Applied Physics. 2014 ; Vol. 115, No. 14.
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