Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation

Z. Bor, B. Racz, G. Szabo, D. Xenakis, C. Kalpouzos, C. Fotakis

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

A subpicosecond KrF laser system (248 nm, 0.5 ps) was used as a light source for ablation of PMMA Mylar and Kapton. The time-dependent reflectivity of the light-induced plasma mirror as measured by 496 nm, 0.5 ps long probe pulses showed an increase of up to 94% with 0.4-1 ps rise time and 10-15 ps fall time. The highdensity plasma mirror shows perfect optical quality, and seems to be a promising light-controlled ultrafast switch for UV and visible light. The spectrum of the UV light reflected from the ablated spot is blue shifted by 0.5 nm and shows 1 nm broadening.

Original languageEnglish
Pages (from-to)365-368
Number of pages4
JournalApplied Physics A Materials Science & Processing
Volume60
Issue number4
DOIs
Publication statusPublished - Apr 1 1995

Keywords

  • 42.80.-f
  • 52.50.Jm

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

Fingerprint Dive into the research topics of 'Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation'. Together they form a unique fingerprint.

  • Cite this