Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation

Z. Bor, B. Racz, G. Szabo, D. Xenakis, C. Kalpouzos, C. Fotakis

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

A subpicosecond KrF laser system (248 nm, 0.5 ps) was used as a light source for ablation of PMMA Mylar and Kapton. The time-dependent reflectivity of the light-induced plasma mirror as measured by 496 nm, 0.5 ps long probe pulses showed an increase of up to 94% with 0.4-1 ps rise time and 10-15 ps fall time. The highdensity plasma mirror shows perfect optical quality, and seems to be a promising light-controlled ultrafast switch for UV and visible light. The spectrum of the UV light reflected from the ablated spot is blue shifted by 0.5 nm and shows 1 nm broadening.

Original languageEnglish
Pages (from-to)365-368
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume60
Issue number4
DOIs
Publication statusPublished - Apr 1995

Fingerprint

Polymers
polymers
Mirrors
Plasmas
Polymethyl Methacrylate
mirrors
Ablation
Mylar (trademark)
Ultraviolet radiation
Kapton (trademark)
Light sources
Switches
ablation
light sources
switches
Lasers
reflectance
probes
pulses
lasers

Keywords

  • 42.80.-f
  • 52.50.Jm

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Materials Science(all)
  • Engineering(all)

Cite this

Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation. / Bor, Z.; Racz, B.; Szabo, G.; Xenakis, D.; Kalpouzos, C.; Fotakis, C.

In: Applied Physics A: Materials Science and Processing, Vol. 60, No. 4, 04.1995, p. 365-368.

Research output: Contribution to journalArticle

Bor, Z. ; Racz, B. ; Szabo, G. ; Xenakis, D. ; Kalpouzos, C. ; Fotakis, C. / Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation. In: Applied Physics A: Materials Science and Processing. 1995 ; Vol. 60, No. 4. pp. 365-368.
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