Femtosecond pulse generation at 193 nm

S. Szatmári, F. P. Schaefer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A compact excimer-dye laser system is developed for subpicosecond pulse generation at 193 nm. In this setup a double-discharge excimer laser (EMG 150) is used both for pumping the seed-pulse generator and for amplification. The seed-pulse generator is a distributed-feedback dye-laser-based subpicosecond dye laser system, generating a 400 fs pulse at 537 nm and a broadband nanosecond pulse centered at 690 nm. By sending these pulses through a H2 Raman cell in a collinear beam, part of the red pulse is amplified, which coincides with the spectral and temporal gain window of the Raman amplifier pumped by the transform-limited 537-nm pulse. Phase-matched frequency mixing of these Raman-amplified pulses with the frequency-doubled 537-nm pulses results in seed-pulse energies of more than 0.1 μJ at 193 nm, with good spatial, spectral and amplitude stability. By double-pass amplification of the seed pulses in the amplifier section of the EMG 150 excimer laser, typically 0.5 mJ output pulses of approximately 800 fs duration are obtained in a 6 mm diameter circular beam. Additional pulse compression in a prism compressor resulted in significant decrease of the pulse duration to less than 400 fs.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsAndre Antonetti
PublisherPubl by Int Soc for Optical Engineering
Pages22-29
Number of pages8
Volume1268
ISBN (Print)0819403156
Publication statusPublished - 1990
EventApplications of Ultrashort Laser Pulses in Science and Technology - Hague, Neth
Duration: Mar 12 1990Mar 13 1990

Other

OtherApplications of Ultrashort Laser Pulses in Science and Technology
CityHague, Neth
Period3/12/903/13/90

Fingerprint

Ultrashort pulses
Dye lasers
Seed
Excimer lasers
Laser pulses
Pulse generators
pulses
Amplification
seeds
Pulse compression
Distributed feedback lasers
dye lasers
excimer lasers
Prisms
Compressors
pulse generators
Mathematical transformations
amplifiers
pulse compression
distributed feedback lasers

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Szatmári, S., & Schaefer, F. P. (1990). Femtosecond pulse generation at 193 nm. In A. Antonetti (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1268, pp. 22-29). Publ by Int Soc for Optical Engineering.

Femtosecond pulse generation at 193 nm. / Szatmári, S.; Schaefer, F. P.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Andre Antonetti. Vol. 1268 Publ by Int Soc for Optical Engineering, 1990. p. 22-29.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Szatmári, S & Schaefer, FP 1990, Femtosecond pulse generation at 193 nm. in A Antonetti (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1268, Publ by Int Soc for Optical Engineering, pp. 22-29, Applications of Ultrashort Laser Pulses in Science and Technology, Hague, Neth, 3/12/90.
Szatmári S, Schaefer FP. Femtosecond pulse generation at 193 nm. In Antonetti A, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1268. Publ by Int Soc for Optical Engineering. 1990. p. 22-29
Szatmári, S. ; Schaefer, F. P. / Femtosecond pulse generation at 193 nm. Proceedings of SPIE - The International Society for Optical Engineering. editor / Andre Antonetti. Vol. 1268 Publ by Int Soc for Optical Engineering, 1990. pp. 22-29
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