Fabrication of phase gratings in glass by ion implantation

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

Transmission phase gratings of grating constants of 4, 6, 8 and 12 μm have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 μm. Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20 %. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsI Cindrich, S.H. Lee
Pages120-131
Number of pages12
Volume3291
DOIs
Publication statusPublished - 1998
EventDiffractive and Holographic Device Technologies and Applications V - San Jose, CA, United States
Duration: Jan 28 1998Jan 29 1998

Other

OtherDiffractive and Holographic Device Technologies and Applications V
CountryUnited States
CitySan Jose, CA
Period1/28/981/29/98

Fingerprint

Diffraction efficiency
Diffraction gratings
Ion implantation
ion implantation
Masks
gratings
Fabrication
Glass
fabrication
glass
Photoresists
Helium
Microscopic examination
implantation
Nitrogen
Scanning electron microscopy
Ions
masks
profiles
nitrogen ions

Keywords

  • Diffraction grating
  • Interference microscopy
  • Ion implantation
  • Phase profile

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Bányász, I., Fried, M., Dücső, C., Vértesy, Z., & Hajdú, C. (1998). Fabrication of phase gratings in glass by ion implantation. In I. Cindrich, & S. H. Lee (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3291, pp. 120-131) https://doi.org/10.1117/12.310575

Fabrication of phase gratings in glass by ion implantation. / Bányász, István; Fried, M.; Dücső, C.; Vértesy, Z.; Hajdú, C.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / I Cindrich; S.H. Lee. Vol. 3291 1998. p. 120-131.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Bányász, I, Fried, M, Dücső, C, Vértesy, Z & Hajdú, C 1998, Fabrication of phase gratings in glass by ion implantation. in I Cindrich & SH Lee (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 3291, pp. 120-131, Diffractive and Holographic Device Technologies and Applications V, San Jose, CA, United States, 1/28/98. https://doi.org/10.1117/12.310575
Bányász I, Fried M, Dücső C, Vértesy Z, Hajdú C. Fabrication of phase gratings in glass by ion implantation. In Cindrich I, Lee SH, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3291. 1998. p. 120-131 https://doi.org/10.1117/12.310575
Bányász, István ; Fried, M. ; Dücső, C. ; Vértesy, Z. ; Hajdú, C. / Fabrication of phase gratings in glass by ion implantation. Proceedings of SPIE - The International Society for Optical Engineering. editor / I Cindrich ; S.H. Lee. Vol. 3291 1998. pp. 120-131
@inproceedings{54ad89695f674281b456a65a3591a041,
title = "Fabrication of phase gratings in glass by ion implantation",
abstract = "Transmission phase gratings of grating constants of 4, 6, 8 and 12 μm have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 μm. Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20 {\%}. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.",
keywords = "Diffraction grating, Interference microscopy, Ion implantation, Phase profile",
author = "Istv{\'a}n B{\'a}ny{\'a}sz and M. Fried and C. D{\"u}cső and Z. V{\'e}rtesy and C. Hajd{\'u}",
year = "1998",
doi = "10.1117/12.310575",
language = "English",
volume = "3291",
pages = "120--131",
editor = "I Cindrich and S.H. Lee",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

TY - GEN

T1 - Fabrication of phase gratings in glass by ion implantation

AU - Bányász, István

AU - Fried, M.

AU - Dücső, C.

AU - Vértesy, Z.

AU - Hajdú, C.

PY - 1998

Y1 - 1998

N2 - Transmission phase gratings of grating constants of 4, 6, 8 and 12 μm have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 μm. Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20 %. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.

AB - Transmission phase gratings of grating constants of 4, 6, 8 and 12 μm have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 μm. Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20 %. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.

KW - Diffraction grating

KW - Interference microscopy

KW - Ion implantation

KW - Phase profile

UR - http://www.scopus.com/inward/record.url?scp=0032225114&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032225114&partnerID=8YFLogxK

U2 - 10.1117/12.310575

DO - 10.1117/12.310575

M3 - Conference contribution

AN - SCOPUS:0032225114

VL - 3291

SP - 120

EP - 131

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Cindrich, I

A2 - Lee, S.H.

ER -