Abstract
In this study we report on a two step method to produce reflection gratings (period: from 266 nm to 3710 nm) in bulk tin (Sn). In our first step, surface relief gratings were etched into fused silica plates by two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) technique based on a nanosecond Q-switched frequency-quadrupled Nd:YAG laser. In the second step the grooved structures were copied into bulk tin by melting and imprinting of tin target. Both the fused silica masters and tin replicas were characterized by atomic force microscopy (AFM). The reachable modulation depths of tin replicas were found to be near constant at each period.
| Original language | English |
|---|---|
| Pages (from-to) | 287-291 |
| Number of pages | 5 |
| Journal | Journal of Laser Micro Nanoengineering |
| Volume | 8 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - Dec 2013 |
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Keywords
- Imprint technique
- Metal gratings
- Submicrometer resolution
- TWIN-LIBWE
ASJC Scopus subject areas
- Industrial and Manufacturing Engineering
- Instrumentation
- Electrical and Electronic Engineering
Cite this
Fabrication of micro- and submicrometer period metal reflection gratings by melt-imprint technique. / Kiss, Bálint; Flender, Roland; Vass, C.
In: Journal of Laser Micro Nanoengineering, Vol. 8, No. 3, 12.2013, p. 287-291.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of micro- and submicrometer period metal reflection gratings by melt-imprint technique
AU - Kiss, Bálint
AU - Flender, Roland
AU - Vass, C.
PY - 2013/12
Y1 - 2013/12
N2 - In this study we report on a two step method to produce reflection gratings (period: from 266 nm to 3710 nm) in bulk tin (Sn). In our first step, surface relief gratings were etched into fused silica plates by two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) technique based on a nanosecond Q-switched frequency-quadrupled Nd:YAG laser. In the second step the grooved structures were copied into bulk tin by melting and imprinting of tin target. Both the fused silica masters and tin replicas were characterized by atomic force microscopy (AFM). The reachable modulation depths of tin replicas were found to be near constant at each period.
AB - In this study we report on a two step method to produce reflection gratings (period: from 266 nm to 3710 nm) in bulk tin (Sn). In our first step, surface relief gratings were etched into fused silica plates by two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) technique based on a nanosecond Q-switched frequency-quadrupled Nd:YAG laser. In the second step the grooved structures were copied into bulk tin by melting and imprinting of tin target. Both the fused silica masters and tin replicas were characterized by atomic force microscopy (AFM). The reachable modulation depths of tin replicas were found to be near constant at each period.
KW - Imprint technique
KW - Metal gratings
KW - Submicrometer resolution
KW - TWIN-LIBWE
UR - http://www.scopus.com/inward/record.url?scp=84891813001&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84891813001&partnerID=8YFLogxK
U2 - 10.2961/jlmn.2013.03.0016
DO - 10.2961/jlmn.2013.03.0016
M3 - Article
AN - SCOPUS:84891813001
VL - 8
SP - 287
EP - 291
JO - Journal of Laser Micro Nanoengineering
JF - Journal of Laser Micro Nanoengineering
SN - 1880-0688
IS - 3
ER -