Fabrication of micro- and submicrometer period metal reflection gratings by melt-imprint technique

Bálint Kiss, Roland Flender, C. Vass

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

In this study we report on a two step method to produce reflection gratings (period: from 266 nm to 3710 nm) in bulk tin (Sn). In our first step, surface relief gratings were etched into fused silica plates by two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) technique based on a nanosecond Q-switched frequency-quadrupled Nd:YAG laser. In the second step the grooved structures were copied into bulk tin by melting and imprinting of tin target. Both the fused silica masters and tin replicas were characterized by atomic force microscopy (AFM). The reachable modulation depths of tin replicas were found to be near constant at each period.

Original languageEnglish
Pages (from-to)287-291
Number of pages5
JournalJournal of Laser Micro Nanoengineering
Volume8
Issue number3
DOIs
Publication statusPublished - Dec 2013

Fingerprint

Tin
micrometers
tin
gratings
Fabrication
fabrication
Metals
metals
Fused silica
replicas
silicon dioxide
Wet etching
Laser beams
YAG lasers
Atomic force microscopy
Melting
melting
Modulation
etching
atomic force microscopy

Keywords

  • Imprint technique
  • Metal gratings
  • Submicrometer resolution
  • TWIN-LIBWE

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Instrumentation
  • Electrical and Electronic Engineering

Cite this

Fabrication of micro- and submicrometer period metal reflection gratings by melt-imprint technique. / Kiss, Bálint; Flender, Roland; Vass, C.

In: Journal of Laser Micro Nanoengineering, Vol. 8, No. 3, 12.2013, p. 287-291.

Research output: Contribution to journalArticle

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